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1.发明公开METHOD OF GLASS SUBSTRATE WORKING AND GLASS PART 有权VERFAHREN ZUR FERTIGUNG EINES GLASSUBSTRATS UND GLASTEIL
公开(公告)号：EP1964820A1
公开(公告)日：2008-09-03
申请号：EP06833178.4
申请日：2006-11-22
发明人： HIDAKA, Takeshi , NAKAMURA, Yasushi , IMAMURA, Tomonori , OKAMOTO, Shinya , KOYO, Hirotaka , SAITO, Yasuhiro , TSUNETOMO, Keiji
CPC分类号： B28D1/00 , B23K26/0006 , B23K26/0084 , B23K26/0624 , B23K26/40 , B23K2203/16 , B23K2203/50 , C03C15/00 , C03C23/0025 , C03C2217/77 , Y10T428/24479
摘要： A glass substrate processing method includes a step of irradiating laser light L onto a glass substrate 1 such that the laser light L is focused within the glass substrate 1, thereby forming a high density area 3 that has a higher density than areas where the laser light L is not irradiated around the portion where the laser light L is focused; and a step of performing chemical etching on the glass substrate 1 using an etching solution such that at least a portion of the high density area is allowed to remain, thereby forming a projection 2 on a surface 1a of the glass substrate 1.
摘要翻译： 玻璃基板处理方法包括以下步骤：将激光L照射到玻璃基板1上，使得激光L聚焦在玻璃基板1内，从而形成具有比激光的区域高的密度的高密度区域3 L不在激光L聚焦的部分周围照射L; 以及使用蚀刻溶液对玻璃基板1进行化学蚀刻的步骤，使得允许保留高密度区域的至少一部分，从而在玻璃基板1的表面1a上形成突起2。
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公开(公告)号：EP1964820B1
公开(公告)日：2014-08-06
申请号：EP06833178.4
申请日：2006-11-22
申请人： Olympus Corporation
发明人： HIDAKA, Takeshi , NAKAMURA, Yasushi , IMAMURA, Tomonori , OKAMOTO, Shinya , KOYO, Hirotaka , SAITO, Yasuhiro , TSUNETOMO, Keiji
CPC分类号： B28D1/00 , B23K26/0006 , B23K26/0084 , B23K26/0624 , B23K26/40 , B23K2203/16 , B23K2203/50 , C03C15/00 , C03C23/0025 , C03C2217/77 , Y10T428/24479
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