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1.发明授权
公开(公告)号：EP0020021B1
公开(公告)日：1986-07-23
申请号：EP80301349.9
申请日：1980-04-24
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2.发明公开Method for the direct electrodeposition of a chromium layer on a metal substrate and a lithographic sheet comprising a metal substrate covered with such an electrodeposited chromium layer 失效一种用于直接dielektrolytischen沉积金属衬底上的铬层和一个平版印刷版，其包含具有在其上的电解这样安装铬层的金属基板的方法。
公开(公告)号：EP0020021A2
公开(公告)日：1980-12-10
申请号：EP80301349.9
申请日：1980-04-24
摘要： Electrodeposition of a layer of chromium of selectively constituted crystalline character and grain texture on metal substrates, such as aluminum or steel base lithographic sheet provides improved and directly chromium plated aluminum or steel base lithographic sheet capable of operatively functioning as a surface plate after exposure of an applied photo sensitive coating thereon. Such chromium layer is disposed in adherent interfacial engagement with the surface of a metal substrate and is compositively constituted of coalescively agglomerated assemblages of subagglomerated spheroidate particles of generally lobular curvilinear contour characterized by an effective absence of generally planar exterior surfaces and relatively sharp protuberant angles.
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3.发明公开
公开(公告)号：EP0020021A3
公开(公告)日：1981-09-16
申请号：EP80301349
申请日：1980-04-24
摘要： Electrodeposition of a layer of chromium of selectively constituted crystalline character and grain texture on metal substrates, such as aluminum or steel base lithographic sheet provides improved and directly chromium plated aluminum or steel base lithographic sheet capable of operatively functioning as a surface plate after exposure of an applied photo sensitive coating thereon. Such chromium layer is disposed in adherent interfacial engagement with the surface of a metal substrate and is compositively constituted of coalescively agglomerated assemblages of subagglomerated spheroidate particles of generally lobular curvilinear contour characterized by an effective absence of generally planar exterior surfaces and relatively sharp protuberant angles.
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