公开(公告)号：EP1116038B1

公开(公告)日：2011-05-04

申请号：EP99946321.9

申请日：1999-09-13

申请人： QinetiQ Limited

发明人： MCNIE, Mark, Edward

IPC分类号： G01P1/00

CPC分类号： G01C19/5677 ,  B81B2203/0109 ,  B81B2207/07 ,  B81C1/00095 ,  G01C19/5712 ,  G01P15/0802

摘要： A method of micro-machining comprising providing a primary region of at least a first material (AA, BB, 56) which contacts a second material (8, 50, 52, 60, 62) at at least one end portion thereof, the method comprising providing an infill material (34, 36, 38) on to the second material, patterning and etching said infill material to form a hole (40, 42) through the infill material to the second material, depositing the first material on to said infill material so that the at least one portion of the first material contacts the second material through the hole. The method can be used to provide a track bridging suspended portions of micro-machined structures, for example the portion referenced (24). Also, a method of narrowing and sealing top portions of channels cut into a wafer is disclosed.

公开(公告)号：EP1982218A1

公开(公告)日：2008-10-22

申请号：EP07705145.6

申请日：2007-02-06

申请人： QINETIQ LIMITED

发明人： MCNIE, Mark, Edward ,  LEWIS, Keith, Loder ,  SCOTT, Andrew, Maxwell ,  SLINGER, Christopher, William ,  BRUNSON, Kevin, Michael ,  SMITH, Gilbert, William

IPC分类号： G02B5/28 ,  G02B26/00

CPC分类号： G02B26/001 ,  G02B5/281 ,  G02B5/284

摘要： A micro-opto-electro-mechanical systems (MOEMS) electro optical modulator (2) having an electrically tuneable optical resonator comprising an asymmetric Fabry-Perot etalon incorporating a mirror (10) resiliency biased with respect to a substrate (13) and moveable in relation thereto in response to a voltage applied there-between. The optical modulator (2) is capable of modulating electromagnetic radiation having a plurality of wavelengths. The modulator is adapted to modulate the transmission of short wave infrared radiation (SWIR), medium wave infrared radiation (MWIR) and long wave infrared radiation (LWIR) and the reflection of visible radiation. A spatial optical modulator having a plurality of said MOEMS optical modulators (2). A method of addressing said spatial optical modulator.

摘要翻译： 一种具有电可调谐光学谐振器的微光电机械系统（MOEMS）电光调制器（2），所述电可调谐光学谐振器包括具有相对于基板（13）弹性偏置的反射镜（10）的不对称法布里 - 珀罗标准具， 响应于施加于其间的电压而与其关联。 光调制器（2）能够调制具有多个波长的电磁辐射。 调制器适用于调制短波红外辐射（SWIR），中波红外辐射（MWIR）和长波红外辐射（LWIR）的传输以及可见辐射的反射。 一种具有多个所述MOEMS光调制器（2）的空间光调制器。 一种寻址所述空间光调制器的方法。

公开(公告)号：EP1946175A1

公开(公告)日：2008-07-23

申请号：EP06794828.1

申请日：2006-10-19

申请人： QinetiQ Limited

发明人： SCOTT, Andrew, Maxwell ,  MCNIE, Mark, Edward ,  BRUNSON, Kevin, Michael

IPC分类号： G02B26/00

CPC分类号： G02B26/001

摘要： An optical modulator comprising a spacing-controllable etalon having at least one sprung micro- mirror suspended above a substrate. At least one electrically insulating stop is provided between the micro-mirror and the substrate to avoid short-circuit when the micro-mirror is drawn towards the substrate by an applied voltage. An optical detector detects the time of arrival of a first laser pulse. A control circuit predicts from this an arrival time of the next incident laser pulse and, responsive to a control signal, either retains the micro-mirror in its pulled-down state held against the insulating stops or releases the micro-mirror at a time predicted to maximise or minimise the light transmitted through the modulator. After a time interval calculated to permit a predetermined number of mechanical oscillations, the micro-mirror is pulled back down onto the stops.

公开(公告)号：EP1116008B1

公开(公告)日：2007-07-18

申请号：EP99946323.5

申请日：1999-09-13

申请人： QinetiQ Limited

发明人： MCNIE, Mark, Edward ,  NAYAR, Vishal

IPC分类号： G01C19/16 ,  G01C19/56

CPC分类号： G01C19/56

摘要： A method of fabricating a micro-mechanical sensor (101) comprising the steps for forming an insulating layer (6) onto the surface of a first wafer (4) bonding a second wafer (2) to the insulating layer (6), patterning and subsequently etching either the first (4) or second wafer (6) such that channels (18, 20) are created in either the first (2) or second (4) wafer terminating adjacent the insulating layer (6) and etching the insulating layer (6) to remove portions of the insulating layer (6) below the etched wafer such that those portions of the etched wafer below a predetermined cross section, suspended portions (22), become substantially freely suspended above the un-etched wafer. This method uses Silicon on Insulator technology. Also disclosed is a micro-mechanical gyrometer structure (101) allowing an anisotropic silicon to be used to fabricate a sensor functioning as if fabricated from isotropic silicon.