摘要:
A development roller includes a magnet roller and a rotatably supported development sleeve including inside thereof the magnet roller, the development sleeve is formed in a cylindrical shape and configured such that a shaft center of the cylindrical shape is inconsistent with a rotation axis of the development sleeve, the development sleeve includes an outer surface provided with many circular or elliptical depressions in a planar view, the depressions being regularly arranged at intervals, and a depth of the depression provided in a portion of the outer surface close to the rotation axis is larger than a depth of the depression provided in a portion of the outer surface far from the rotation axis.
摘要:
A development roller includes a magnet roller and a rotatably supported development sleeve including inside thereof the magnet roller, the development sleeve is formed in a cylindrical shape and configured such that a shaft center of the cylindrical shape is inconsistent with a rotation axis of the development sleeve, the development sleeve includes an outer surface provided with many circular or elliptical depressions in a planar view, the depressions being regularly arranged at intervals, and a depth of the depression provided in a portion of the outer surface close to the rotation axis is larger than a depth of the depression provided in a portion of the outer surface far from the rotation axis.
摘要:
A develop roller (115) includes a magnet roller (133), and a develop sleeve (132) containing the magnet roller (133) and comprising a plurality of depressions (139) in an elliptic shape regularly arranged with an interval in a longitudinal direction on a surface onto which developer (126) is attracted by a magnetic force of the magnet roller (133), in which the depressions (139) are arranged such that a longitudinal direction of the depressions (139) is intersected with the longitudinal direction of the develop sleeve (132), and a downstream side of the depressions (139) are formed to be deeper than an upstream side in a rotary direction of the develop sleeve (132).
摘要:
A magnet roller (133) includes a magnetic field generator being columnar, a support element being columnar (33, 34), coaxially provided at both ends of the magnetic field generator (31), and whose diameter is smaller than that of the magnetic field generator (31), a level element extending along an axis of the magnetic field generator (31) with a distance from the axis, the distance larger than the diameter of the support element (33, 34), and a high magnetic power element being a main magnetic pole provided on the level element, extending long along the axis of the magnetic field generator (31).
摘要:
A develop unit (4) is configured to include a developer roller (5) having a developer sleeve (5c) and a magnetic roller (5b) with a magnetic pole (13), a supply path (9) formed in parallel with an axial direction of the developer roller (5), a supply screw (8) supplying the developer to the developer roller (5), and a first bulkhead (133) forming the supply path (9). In the developer unit (4), the magnetic pole (13) is disposed so that a normal line (K) through a maximum magnetic flux density point (P) in a circumferential direction coincides with a tangent line to an upper portion of the supply screw (8) in a rotary direction, the maximum magnetic flux density point (P) being a point at which a density of a magnetic flux from the magnetic pole is maximum on an outer surface of the developer sleeve (5c).
摘要:
A developer holding member (115) includes a magnetic field generating device (133) and a hollow body (132) including the magnetic field generating device thereinside, and attracting a developer to an external surface thereof with magnetic force of the magnetic field generating device. The external surface of the hollow body is randomly provided with a large number of depressions (139), and a peak intensity of a spectrum within a range of wavelengths not more than 1 mm, which is figured out by performing a frequency analysis using a profile curve in a circumferential direction of the external surface, is not more than 12.