公开(公告)号：EP3995249A1

公开(公告)日：2022-05-11

申请号：EP21202411.1

申请日：2021-10-13

申请人： Ricoh Company, Ltd.

发明人： MIYANISHI, Hideiji ,  HIRAYAMA, Rie ,  FUJITA, Kazuhiro

IPC分类号： B23K26/00 ,  B23K26/082 ,  B23K26/08 ,  B23K26/352 ,  B23K26/362 ,  B23K26/402 ,  B41M3/14 ,  B65D23/00 ,  B23K101/04 ,  B23K103/00

摘要： A pattern formation apparatus is configured to irradiate each of a plurality of base materials (1a) being conveyed, with laser such that one of a light path length and a beam size at a position of the plurality of base materials (1a) is approximately constant, to form a pattern (11) on a surface of each of the plurality of base materials (1a).