公开(公告)号：EP2465011A1

公开(公告)日：2012-06-20

申请号：EP10749622.6

申请日：2010-08-06

申请人： Süss Microtec Lithography GmbH

发明人： ISHII, Takaaki ,  HÜLSMANN, Thomas ,  HICKMANN, Tobias

IPC分类号： G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/7035 ,  G03F7/70783

摘要： The invention relates to a method and a device for keeping the dimensions of a mask (6) in the mask plane constant during lithography. The mask (6) is heated by exposure during lithography. The dimensions of the mask (6) are kept constant using thermal and/or mechanical methods. In addition, further methods or devices, such as air cooling (17) or air heating (17), may be employed to prevent a change in the mask dimensions on the mask plane.