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公开(公告)号：EP3235946A4
公开(公告)日：2018-07-25
申请号：EP15869533
申请日：2015-12-10
申请人： SEIREN CO LTD
发明人： KAWAMURA KAZUNORI
CPC分类号： D06Q1/08 , D03D15/00 , D06C23/04 , D06C2700/31 , D06M23/00
摘要： Provided is a fabric to which an uneven-surface design which is fine and has flexibility and wear resistance is imparted. The fabric has a polyurethane resin applied portion on at least a portion of a surface side of the fabric, and an uneven-surface design shaped on the polyurethane resin applied portion. The polyurethane resin applied portion is a region in which a polyurethane resin which is applied is present, and the polyurethane resin permeates between the fibers at least in a surface portion of the fabric such that a surface of the fabric is formed by the polyurethane resin and the fibers. In the polyurethane resin applied portion, an application depth of the polyurethane resin is 50 to 200 µm, a filling ratio of the polyurethane resin is 15% to 45%, and a filling ratio of the fibers of the fabric is 50% to 80%.
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公开(公告)号：EP3235947A4
公开(公告)日：2018-07-25
申请号：EP15869534
申请日：2015-12-10
申请人： SEIREN CO LTD
发明人： IZUMI TAKURO , KAWAMURA KAZUNORI
CPC分类号： D06Q1/08 , D03D15/00 , D06C23/04 , D06C2700/31
摘要： Provided is a fabric having a novel design in which an uneven-surface design is partially formed by embossing. A polyurethane resin is applied to the surface of the fabric having, on the surface, a low fineness portion and a high fineness portion having a higher single fiber fineness than that of the low fineness portion, the fabric is dried; and embossing is performed on the surface of the fabric. By performing the embossing, while an uneven-surface design is not imparted to the high fineness portion by the embossing and a non-uneven-surface design portion 3 is formed, the uneven-surface design is imparted to the low fineness portion by the embossing and an uneven-surface design portion 2 is formed.
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