Method for producing light-emitting diode
    1.
    发明公开
    Method for producing light-emitting diode 失效
    Verfahren zum Herstellen einer lichtemittierenden Diode。

    公开(公告)号:EP0685892A2

    公开(公告)日:1995-12-06

    申请号:EP95303696.9

    申请日:1995-05-31

    IPC分类号: H01L33/00 H01L21/208

    CPC分类号: H01L33/305 H01L33/0062

    摘要: A method for producing a light-emitting diode provided with a pn junction of GaP containing nitrogen on an n-type GaP substrate, includes the steps of: forming an n-type GaP layer on the n-type GaP substrate by epitaxial growth by bringing the n-type GaP substrate into contact with an oversaturated melted Ga; forming an n-type GaP:N layer having a low n-type carrier concentration on the n-type GaP layer by epitaxial growth by bringing the melted Ga into contact with NH 3 gas; and forming a p-type GaP:N layer having a carrier concentration almost equal to a carrier concentration of the n-type GaP:N layer on the n-type GaP:N layer.

    摘要翻译: 一种制造在n型GaP衬底上具有含有氮的GaP的pn结的发光二极管的方法包括以下步骤:通过外延生长在n型GaP衬底上形成n型GaP层, n型GaP衬底与过饱和熔融Ga接触; 通过使熔融的Ga与NH 3气体接触,通过外延生长在n型GaP层上形成具有低n型载流子浓度的n型GaP:N层; 并形成在n型GaP:N层上具有几乎等于n型GaP:N层的载流子浓度的载流子浓度的p型GaP:N层。

    Method for producing light-emitting diode
    2.
    发明公开
    Method for producing light-emitting diode 失效
    制造发光二极管的方法。

    公开(公告)号:EP0685892A3

    公开(公告)日:1998-04-01

    申请号:EP95303696.9

    申请日:1995-05-31

    IPC分类号: H01L33/00 H01L21/208

    CPC分类号: H01L33/305 H01L33/0062

    摘要: A method for producing a light-emitting diode provided with a pn junction of GaP containing nitrogen on an n-type GaP substrate, includes the steps of: forming an n-type GaP layer on the n-type GaP substrate by epitaxial growth by bringing the n-type GaP substrate into contact with an oversaturated melted Ga; forming an n-type GaP:N layer having a low n-type carrier concentration on the n-type GaP layer by epitaxial growth by bringing the melted Ga into contact with NH 3 gas; and forming a p-type GaP:N layer having a carrier concentration almost equal to a carrier concentration of the n-type GaP:N layer on the n-type GaP:N layer.