-
公开(公告)号:EP3945140A1
公开(公告)日:2022-02-02
申请号:EP21188407.7
申请日:2021-07-29
发明人: KIM, Jeongkuk , KIM, Hwi , LEE, Areum , JEONG, Da-Hee , HWANG, Kyu Hwan , NAM, Kanghyun , JIN, Seungmin , HONG, Jaemin
摘要: A mask includes a mask sheet provided with a plurality of open areas defined therein in a plan view and a mask frame which supports the mask sheet. The mask sheet includes a first portion including a first surface, where the first surface is configured to be in contact with a target substrate, and a second portion disposed on the first portion, extending from a top of the first portion in a first direction and including a second surface defining the open area. The second surface is an inclined surface inclined downward with respect to the first direction, and the first direction is parallel to a plane in which the first surface is included.