Method of forming identification marks for a display substrate and a display device using the same
    1.
    发明公开
    Method of forming identification marks for a display substrate and a display device using the same 审中-公开
    一种制备的识别特性的显示基板和相关联的显示设备处理

    公开(公告)号:EP1921490A1

    公开(公告)日:2008-05-14

    申请号:EP07021548.8

    申请日:2007-11-06

    IPC分类号: G02F1/1333

    摘要: A method of forming a cell identification (201) includes forming a metal layer on a substrate, coating a photoresist material on the metal layer to form a photoresist film, exposing the photoresist film through a mask including a light-blocking pattern corresponding to a cell identification pattern, developing an exposed photoresist film, etching the metal layer using a developed photoresist film to form a metal pattern including the cell identification pattern, and irradiating a laser beam onto a symbol of the cell identification pattern. Furthermore, a display region (180) and a peripheral region (185) are defined on the substrate. An image is displayed in the display region (180). The peripheral region (185) surrounds the display region (180).
    The cell identification (201) formed in the peripheral region (185) includes the cell identification pattern and a mark (200) marked on the cell identification pattern. The cell identification pattern may be either a steady part (120) or a transient part (110). The steady part (120) is not changed during manufacturing processes. The transient part (110) is marked by the mark (200) during each of the manufacturing processes. The transient part (110) includes a plurality of cell identification arrays (101,103 and 105).

    摘要翻译: 一种形成小区标识(201)的方法,包括:形成在基片的金属层,所述金属层上涂覆光致抗蚀剂材料,以形成一个光致抗蚀剂膜,电影,暴露光致抗蚀剂膜通过掩模包括光阻挡图案对应于小区 识别图案,曝光的光刻胶电影显影,使用显影的光刻胶膜以形成金属图案包括小区标识图案蚀刻所述金属层,和照射激光束到所述小区标识图案的象征。 进一步,显示区域(180)和外围区域(185)的在基板上限定。 的图像被显示在显示区域(180)。 周边区域(185)包围显示区域(180)。 在外围区(185)形成的小区标识(201)包括小区标识图案和标记在细胞识别模式的标记(200)。 小区识别图案可以是一个稳定的部分(120)或瞬态部分(110)。 稳定部(120),在制造过程中不改变。 瞬时部分(110)由各个制造工序的过程中的标记(200)标记。 瞬时部分(110)包括小区标识阵列(101,103和105)的复数。