公开(公告)号：EP2548072A1

公开(公告)日：2013-01-23

申请号：EP11711057.7

申请日：2011-03-14

申请人： Samsung LCD Netherlands R&D Center B.V.

发明人： MASSARD, Romaric ,  COMETTI, Chiara ,  FEENSTRA, Bokke Johannes

IPC分类号： G02B26/02

CPC分类号： G02B26/005

摘要： The present invention relates to a method for making a support plate for an electrowetting device. The method comprises the steps of: providing the support plate with a hydrophobic layer; arranging a pattern of hydrophilic material on the hydrophobic layer; and removing a surface layer of the hydrophobic layer by a solvent. The present invention further relates to an electrowetting device including a support plate that comprises a hydrophobic layer having a thickness, and a pattern of hydrophilic material arranged on a first area of the hydrophobic layer, the thickness of the hydrophobic layer being larger within the first area than outside the first area.