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公开(公告)号：EP1933204A3
公开(公告)日：2010-10-13
申请号：EP07254871.2
申请日：2007-12-14
发明人： Ueda, Shuhei , Shibano, Yukio
IPC分类号： G03F1/14
CPC分类号： G03F1/68 , Y02P20/582
摘要： A used large-size photomask substrate having a patterned light-shielding film is recycled by (i) removing the light-shielding film from the used substrate to provide a photomask-forming glass substrate stock, (ii) resurfacing the glass substrate stock by sand blasting, (iii) repolishing the resurfaced glass substrate stock to yield a regenerated glass substrate stock, (iv) applying a light-shielding film onto the regenerated glass substrate stock to yield a regenerated photomask-forming blank, and (v) processing the light-shielding film of the blank into a pattern corresponding to the desired exposure of a mother glass, yielding a regenerated photomask substrate.
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公开(公告)号：EP2339399B1
公开(公告)日：2016-02-17
申请号：EP10252063.2
申请日：2010-12-06
IPC分类号： G03F1/00
CPC分类号： G03F1/60 , G03F1/14 , Y10T428/24488
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公开(公告)号：EP2236246B1
公开(公告)日：2013-04-24
申请号：EP10250688.8
申请日：2010-03-31
发明人： Shibano, Yukio , Watabe, Atsushi
IPC分类号： C03C19/00
CPC分类号： C03C19/00
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公开(公告)号：EP2339399A3
公开(公告)日：2012-03-28
申请号：EP10252063.2
申请日：2010-12-06
IPC分类号： G03F1/14
CPC分类号： G03F1/60 , G03F1/14 , Y10T428/24488
摘要： A photomask-forming glass substrate having a square major surface is provided wherein two strip regions are defined on the major surface near a pair of opposed sides such that each region spans between 2 mm and 10 mm inward of the side and excludes end portions extending 2 mm inward from the opposed ends of the side, a least squares plane is computed for each of the two strip regions, the angle included between normal lines to the least squares planes of two strip regions is within 10 seconds, and the height difference between two strip regions is up to 0.5 µm.
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公开(公告)号：EP1933204B1
公开(公告)日：2019-02-13
申请号：EP07254871.2
申请日：2007-12-14
发明人： Ueda, Shuhei , Shibano, Yukio
IPC分类号： G03F1/68
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6.发明公开Photomask-forming glass substrate and making method 有权Photomaskenbildendes Glassubstrat和Herstellungsverfahren
公开(公告)号：EP2339399A2
公开(公告)日：2011-06-29
申请号：EP10252063.2
申请日：2010-12-06
IPC分类号： G03F1/14
CPC分类号： G03F1/60 , G03F1/14 , Y10T428/24488
摘要： A photomask-forming glass substrate having a square major surface is provided wherein two strip regions are defined on the major surface near a pair of opposed sides such that each region spans between 2 mm and 10 mm inward of the side and excludes end portions extending 2 mm inward from the opposed ends of the side, a least squares plane is computed for each of the two strip regions, the angle included between normal lines to the least squares planes of two strip regions is within 10 seconds, and the height difference between two strip regions is up to 0.5 µm.
摘要翻译： 提供了具有正方形主表面的光掩模形成玻璃基板，其中在一对相对侧附近的主表面上限定两个条带区域，使得每个区域跨越侧面向内延伸2mm至10mm，并且不包括延伸2 从侧面的相对端向内mm，对于两个条带区域中的每一个计算最小二乘平面，包括在两个条带区域的最小二乘平面的法线之间的角度在10秒内，并且两个区域之间的高度差 带状区域可达0.5μm。
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7.发明公开Method for producing large-size synthetic quartz glass substrate 有权Verfahren zur Herstellung einesgroßensynthetischen Quarzglassubstrats
公开(公告)号：EP2236246A1
公开(公告)日：2010-10-06
申请号：EP10250688.8
申请日：2010-03-31
发明人： Shibano, Yukio , Watabe, Atsushi
CPC分类号： C03C19/00
摘要： A large-size synthetic quartz glass substrate is produced by measuring a flatness and parallelism of front and back surfaces of a synthetic quartz glass substrate stock having a diagonal length of at least 1,000 mm, and partially removing raised portions and thick portions of the substrate stock on the basis of the measured data of flatness and parallelism. The removing step includes abrasive working by a first working tool having a diameter of 15-50% of the diagonal length, and abrasive working by a second working tool having a smaller diameter.
摘要翻译： 通过测量对角线长度至少为1000mm的合成石英玻璃基板原料的前后表面的平坦度和平行度，并且部分地去除基板原料的凸起部分和厚部分来制造大尺寸的合成石英玻璃基板 在平坦度和平行度的测量数据的基础上。 去除步骤包括通过具有对角线长度的15-50％的直径的第一加工工具进行研磨加工，并且通过具有较小直径的第二加工工具进行研磨加工。
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公开(公告)号：EP1933204A2
公开(公告)日：2008-06-18
申请号：EP07254871.2
申请日：2007-12-14
发明人： Ueda, Shuhei , Shibano, Yukio
IPC分类号： G03F1/14
CPC分类号： G03F1/68 , Y02P20/582
摘要： A used large-size photomask substrate having a patterned light-shielding film is recycled by (i) removing the light-shielding film from the used substrate to provide a photomask-forming glass substrate stock, (ii) resurfacing the glass substrate stock by sand blasting, (iii) repolishing the resurfaced glass substrate stock to yield a regenerated glass substrate stock, (iv) applying a light-shielding film onto the regenerated glass substrate stock to yield a regenerated photomask-forming blank, and (v) processing the light-shielding film of the blank into a pattern corresponding to the desired exposure of a mother glass, yielding a regenerated photomask substrate.
摘要翻译： 通过（i）从使用的基板上除去遮光膜以提供光掩模形成玻璃基板原料，（ii）通过砂覆盖玻璃基板原料，再循环使用具有图案化遮光膜的已使用的大尺寸光掩模基板 喷砂，（iii）重新铺上重新涂覆的玻璃基板原料以产生再生的玻璃基板原料，（iv）将光屏蔽膜施加到再生的玻璃基板原料上以产生再生的光掩模形成坯料，和（v）加工光 将该坯料的遮光膜变成对应于母玻璃所需曝光的图案，产生再生的光掩模基板。
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