公开(公告)号：EP1840948B1

公开(公告)日：2014-04-09

申请号：EP05816466.6

申请日：2005-12-19

申请人： Stella Chemifa Corporation

发明人： Kikuyama, Hirohisa, c/o Izumi Factory ,  Waki, Masahide, c/o Izumi Factory ,  Ito, Kanenori, c/o Sanpo Factory ,  Kujime, Takanobu, c/o Sanpo Factory ,  Nii, Keiichi, c/o Sanpo Factory ,  Hasebe, Rui, c/o Sanpo Factory ,  Tsurumaru, Hitoshi, c/o Sanpo Factory ,  Nakashima, Hideki, c/o Sanpo Factory

IPC分类号： H01L21/3213 ,  C23F1/26

CPC分类号： H01L21/32134 ,  C23F1/26 ,  H01L27/124

公开(公告)号：EP1840948A1

公开(公告)日：2007-10-03

申请号：EP05816466.6

申请日：2005-12-19

申请人： Stella Chemifa Corporation

发明人： Kikuyama, Hirohisa, c/o Izumi Factory ,  Waki, Masahide, c/o Izumi Factory ,  Ito, Kanenori, c/o Sanpo Factory ,  Kujime, Takanobu, c/o Sanpo Factory ,  Nii, Keiichi, c/o Sanpo Factory ,  Hasebe, Rui, c/o Sanpo Factory ,  Tsurumaru, Hitoshi, c/o Sanpo Factory ,  Nakashima, Hideki, c/o Sanpo Factory

IPC分类号： H01L21/306 ,  C23F1/26

CPC分类号： H01L21/32134 ,  C23F1/26 ,  H01L27/124

摘要： A fine treatment agent according to the present invention is a fine treatment agent for the fine treatment of a multilayer film, including a tungsten film and a silicon oxide film comprising at least one from among hydrogen fluoride, nitric acid, ammonium fluoride and ammonium chloride. Thus, a fine treatment agent which makes fine treatment on a multilayer film, including a tungsten film and a silicon oxide film, possible by controlling the etching rate and a fine treatment method using the same can be provided.

摘要翻译： 根据本发明的精细处理剂是用于精细处理包括钨膜和氧化硅膜的多层膜的精细处理剂，其包含氟化氢，硝酸，氟化铵和氯化铵中的至少一种。 因此，可以提供通过控制蚀刻速率和使用其的精细处理方法对包括钨膜和氧化硅膜在内的多层膜进行精细处理的精细处理剂。