摘要:
A method for growing a Group III nitride semiconductor crystal (15) by sublimating a material (13) containing a Group III nitride semiconductor and depositing a sublimated material gas, comprising the steps of: preparing a chamber (101) including a heat-shielding portion (110), made from tantalum or tungsten, for shielding heat radiation from said material (13) therein; arranging said material (13) on one side of said heat-shielding portion (110) in said chamber (101); and growing said Group III nitride semiconductor crystal (15) by heating said material (13) to be sublimated, and depositing said material gas on the other side of said heat-shielding portion (110) in said chamber (101).
摘要:
The application concerns a method of manufacturing a wavelength converter whereby the transmissivity can be improved. A method of manufacturing a wavelength converter (10 a ) comprises the following steps. At first, a crystal is grown. Then a first crystal part (11) and a second crystal part (12) are formed by sectioning the crystal into two; the second crystal part (12) is flipped with respect to the first crystal part (11) in such a way that the directions of spontaneous polarisation of the crystal parts are mutually reserved. The first and second crystals (11) and (12) are then interlocked in such a way that a domain inversion structure in which the directions of spontaneous polarisation of the first and second crystals (11) and (12) are periodically reversed along an optical waveguide (13) is formed, and the domain inversion structure satisfies quasi-phase-matching conditions for an incoming beam (101).
摘要:
A method of manufacturing a wavelength converter (10d) that has an optical waveguide (13) and that converts the wavelength of an incoming beam (101) input into the optical waveguide through one end (13a) thereof, and outputs an outgoing beam (102) from the optical waveguide through the other end (13b) thereof, the wavelength converter manufacturing method comprising: a step of growing a first crystal (11); a step of forming two or more regularly arrayed projections (11c) in a surface (11a) of the first crystal (11); and a step of growing a second crystal (16), being an amorphous crystal in which there is essentially no difference in refractive index from that of the first crystal (11), onto said surface (11a) of the first crystal (11); wherein in said step of growing the second crystal, the first and second crystals are formed in such a way that a domain inversion structure in which the polar directions of the first and second crystals periodically reverse along the optical waveguide is created, and the domain inversion structure satisfies quasi-phase-matching conditions for the incoming beam.
摘要:
A method for growing a Group III nitride semiconductor crystal is provided with the following steps: First, a chamber (101) including a heat-shielding portion (110) for shielding heat radiation from a material 13 therein is prepared. Then, material 13 is arranged on one side of heat-shielding portion (110) in chamber (101). Then, by heating material (13) to be sublimated, a material gas is deposited on the other side of heat-shielding portion (110) in chamber (101) so that a Group III nitride semiconductor crystal (15) is grown.