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    Gas supply path structure, gas supply method, laser oscillating apparatus, exposure apparatus, and device production method
    1.
    发明公开
    Gas supply path structure, gas supply method, laser oscillating apparatus, exposure apparatus, and device production method 有权
    Gaszuführungsstrukturund -verfahren，Laseroszillator，Belichtungsvorrichtung，und Verfahren zur Herstellung einer Einrichtung

    公开(公告)号：EP0997225A1

    公开(公告)日：2000-05-03

    申请号：EP99308543.0

    申请日：1999-10-28

    申请人： TADAHIRO OHMI ,  CANON KABUSHIKI KAISHA

    发明人： Ohmi, Tadahiro ,  Osawa, Hiroshi ,  Ino, Kazuhide ,  Shirai, Yasuyuki ,  Tanaka, Nobuyoshi ,  Shinohara, Toshikuni ,  Hirayama, Masaki

    IPC分类号： B23K26/00 ,  H01S3/036

    CPC分类号： H01S3/036

    摘要： A gas supply path structure forms a fluid path for allowing a laser gas to flow into or out of a pair of fluid inlet and outlet 11a and a laser gas is controlled to a predetermined subsonic speed at a throat portion. Gas supplies for controlling the speed of the gas are connected each to the fluid inlet and to the fluid outlet of the gas supply path structure and, together with a cooling device, compose a circulation system for controlling the speed and pressure of the laser gas at the fluid inlet and/or at the fluid outlet.

    摘要翻译： 气体供给路径结构形成用于允许激光气体流入或流出一对流体入口和出口11a的流体路径，并且在喉部处将激光气体控制到预定的亚音速。 用于控制气体速度的气体供应装置连接到流体入口和气体供给路径结构的流体出口，并且与冷却装置一起构成用于控制激光气体的速度和压力的循环系统 流体入口和/或流体出口处。

    An excimer laser generator, blowers and heat exchangers for use therein, and an exposure apparatus including the same
    4.
    发明公开
    An excimer laser generator, blowers and heat exchangers for use therein, and an exposure apparatus including the same 失效
    受激准分子激光器产生，风机和热交换器用于其中的，以及含有该曝光装置

    公开(公告)号：EP0794598A1

    公开(公告)日：1997-09-10

    申请号：EP97301522.5

    申请日：1997-03-06

    申请人： CANON KABUSHIKI KAISHA ,  Ohmi, Tadahiro

    发明人： Ohmi, Tadahiro ,  Shirai, Yasuyuki ,  Sano, Naoto

    IPC分类号： H01S3/036 ,  H01S3/225

    CPC分类号： H01S3/0305 ,  H01S3/036 ,  H01S3/225

    摘要： An excimer laser generating system includes a laser chamber (1) whose inner surface (101) is covered with a fluorine-passivated surface. Preferably, the surfaces (102,103) of a blower (23) and heat exchanger (24) disposed in the laser chamber(1) are also covered with a fluorine-passivated surface. The fluorine-passivated surface (101,102,103) may be formed of a wide variety of materials including an aluminum oxide film, a fluoride film containing aluminum fluoride and magnesium fluoride, iron fluoride, and nickel fluoride. Preferably, the excimer laser generation system includes a gas supply system having an inert gas purging system so that gas sources can be replaced without exposing the inside of gas supply pipes to atmosphere. With the above arrangement, the excimer laser generating system can generate a laser beam pulse whose energy and shape are maintained constant for a long period of operation time without encountering serious degradation. The invention also provides a high-reliability step-and-repeat exposure apparatus using the above excimer laser generating system, capable of exposing a very fine pattern.

    摘要翻译： 受激准分子激光器产生系统包括一个激光室（1），其内表面（101）覆盖有氟钝化表面。 所以优选的是，送风机（23）和在所述激光室（1），设置热交换器（24）的表面（102,103）覆盖有氟钝化表面。 氟钝化表面（101,102,103）可形成各种各样的包括在氧化铝上的电影材料中，氟化物膜含氟化铝和氟化镁，氟化铁，氟化镍。 优选地，受激准分子激光器产生系统包括具有至惰性气体吹扫系统的气体供给系统，以便没有气体源能够在不气体供给管的内部暴露于大气中进行更换。 利用上述布置，受激准分子激光器产生系统可产生激光束脉冲，其能量和形状保持恒定的操作很长一段时间，而不会遇到的严重降解。 因此本发明提供一种高可靠性的步进重复曝光使用上述准分子激光产生系统装置，能够露出非常精细的图案。