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公开(公告)号:EP0821745A1
公开(公告)日:1998-02-04
申请号:EP96911614.0
申请日:1996-04-08
发明人: GLEZEN, John, H. , NASEEM, Hameed, A. , BROWN, William, D. , SCHAPER, Leonard, W. , MALSHE, Ajay, P.
摘要: Disclosed is an electroplating method and products made therefrom, which in one embodiment includes using a current density J0, to form a conductive metal layer (30) having a surface roughness no greater than the surface roughness (20) of the underlying member (10). In another embodiment of electroplating a substrate surface having peaks and valleys, the method includes electroplating a conductive metal onto the peaks to cover the peaks with the conductive metal, and into the valleys to substantially fill the valleys with the conductive metal.