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1.发明授权Apparatus for distributing gas and liquid during concurrent gas/liquid backwash in filter underdrain flumes 有权的直流扫气期间的设备用于在过滤器暗渠系统的气体和液体的分配
公开(公告)号：EP0933111B1
公开(公告)日：2008-02-27
申请号：EP99300636.0
申请日：1999-01-28
CPC分类号： B01D24/24 , B01D24/4631 , B01D2201/48
摘要： A concurrent backwash distribution apparatus for a filter (11) having a filter tank (13) and a plurality of underdrain laterals (24) includes a baffle (10) positioned in a common main conduit (12) to define an auxiliary flume (14) between the baffle (10) and the underdrain laterals (24). The auxiliary flume (14) is in fluid communication with the common main conduit (12) and the underdrain laterals (24). The baffle (10) has at least one flume liquid metering orifice (16) preferably located near the bottom of the baffle (10) so that it may be below a gas/liquid interface in the auxiliary flume (14) during concurrent gas/liquid backwash operations. A flow distribution plate (18) may be positioned between the auxiliary flume (14) and the underdrain laterals (24), the flow distribution plate (18) having at least one liquid metering orifice and at least one gas metering orifice. The baffle (10) may take one of many forms. The baffle (10) creates an adequate liquid pool in the common main conduit for low velocity flow of backwash liquid while at the same time providing uninhibited flow of backwash gas. Maldistribution is thereby controlled. Stand-pipes (35) may be used in place of the baffle (10). A method for concurrent gas/liquid backwash according to the invention is also disclosed. The invention may be applied to flat bottom flumes or insufficiently recessed flumes.
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2.发明公开Apparatus for distributing gas and liquid during concurrent gas/liquid backwash in filter underdrain flumes 有权的直流扫气期间的设备用于在过滤器暗渠系统的气体和液体的分配
公开(公告)号：EP0933111A3
公开(公告)日：2002-01-02
申请号：EP99300636.0
申请日：1999-01-28
CPC分类号： B01D24/24 , B01D24/4631 , B01D2201/48
摘要： A concurrent backwash distribution apparatus for a filter (11) having a filter tank (13) and a plurality of underdrain laterals (24) includes a baffle (10) positioned in a common main conduit (12) to define an auxiliary flume (14) between the baffle (10) and the underdrain laterals (24). The auxiliary flume (14) is in fluid communication with the common main conduit (12) and the underdrain laterals (24). The baffle (10) has at least one flume liquid metering orifice (16) preferably located near the bottom of the baffle (10) so that it may be below a gas/liquid interface in the auxiliary flume (14) during concurrent gas/liquid backwash operations. A flow distribution plate (18) may be positioned between the auxiliary flume (14) and the underdrain laterals (24), the flow distribution plate (18) having at least one liquid metering orifice and at least one gas metering orifice. The baffle (10) may take one of many forms. The baffle (10) creates an adequate liquid pool in the common main conduit for low velocity flow of backwash liquid while at the same time providing uninhibited flow of backwash gas. Maldistribution is thereby controlled. Stand-pipes (35) may be used in place of the baffle (10). A method for concurrent gas/liquid backwash according to the invention is also disclosed. The invention may be applied to flat bottom flumes or insufficiently recessed flumes.
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3.发明公开Apparatus for distributing gas and liquid during concurrent gas/liquid backwash in filter underdrain flumes 有权的直流扫气期间的设备用于在过滤器暗渠系统的气体和液体的分配
公开(公告)号：EP0933111A2
公开(公告)日：1999-08-04
申请号：EP99300636.0
申请日：1999-01-28
CPC分类号： B01D24/24 , B01D24/4631 , B01D2201/48
摘要： A concurrent backwash distribution apparatus for a filter (11) having a filter tank (13) and a plurality of underdrain laterals (24) includes a baffle (10) positioned in a common main conduit (12) to define an auxiliary flume (14) between the baffle (10) and the underdrain laterals (24). The auxiliary flume (14) is in fluid communication with the common main conduit (12) and the underdrain laterals (24). The baffle (10) has at least one flume liquid metering orifice (16) preferably located near the bottom of the baffle (10) so that it may be below a gas/liquid interface in the auxiliary flume (14) during concurrent gas/liquid backwash operations. A flow distribution plate (18) may be positioned between the auxiliary flume (14) and the underdrain laterals (24), the flow distribution plate (18) having at least one liquid metering orifice and at least one gas metering orifice. The baffle (10) may take one of many forms. The baffle (10) creates an adequate liquid pool in the common main conduit for low velocity flow of backwash liquid while at the same time providing uninhibited flow of backwash gas. Maldistribution is thereby controlled. Stand-pipes (35) may be used in place of the baffle (10). A method for concurrent gas/liquid backwash according to the invention is also disclosed. The invention may be applied to flat bottom flumes or insufficiently recessed flumes.
摘要翻译： 对于具有一个过滤箱（13）和暗渠分支管的多个（24）的过滤器（11）一种共存流体回流分配装置包括一共用总管（12），其定位的挡板（10）在辅助水道来定义（14） 挡板（10）和暗渠分支管（24）之间。 辅助水道（14）与共用总管（12）和暗渠分支管（24）流体连通。 挡板（10）具有至少一个水道液体计量孔（16）优选地位于邻近所述挡板（10）的底部，所以也可以是下面在并发的气/液时的辅助水道（14）的气/液界面 反洗操作。 流动分配板（18）可在辅助水道（14）和暗渠分支管（24）之间被定位，具有至少一个液体计量孔和至少一个气体计量孔的流量分配板（18）。 挡板（10）可以采取许多形式中的一种。 挡板（10）创建到在反冲洗液体的低速度流共用总管足够液池，而在同一时间提供反洗气体的未抑制流动。 分布不均从而控制。 竖管（35）来代替所述挡板（10）的使用。 一种用于并发的气/液反洗gemäß游离缺失到本发明光盘gibt方法。 本发明可以被应用到平底水槽或没有充分凹进水槽。
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