VIRTUAL ION TRAP
    1.
    发明公开
    VIRTUAL ION TRAP 有权
    VIRTUELLE IONENFALLE

    公开(公告)号:EP1651941A4

    公开(公告)日:2008-03-26

    申请号:EP04777177

    申请日:2004-06-28

    CPC分类号: A41C5/005 H01J49/4295

    摘要: A virtual ion trap that uses electric focusing fields instead of machined metal electrodes that normally surround the trapping volume, wherein two opposing surfaces include a plurality of uniquely designed and coated electrodes, and wherein the electrodes can be disposed on the two opposing surfaces using plating techniques that enable much higher tolerances to be met than existing machining techniques.

    摘要翻译: 一种虚拟离子阱,其使用电聚焦场而不是通常围绕捕获体积的加工的金属电极,其中两个相对的表面包括多个独特设计和涂覆的电极,并且其中电极可以使用电镀技术设置在两个相对的表面上 这使得现有的加工技术能够实现更高的公差。