公开(公告)号：EP1904932A4

公开(公告)日：2013-02-27

申请号：EP06824764

申请日：2006-06-19

申请人： UNIV NORTH CAROLINA ,  UNIV NORTH CAROLINA STATE ,  LIQUIDIA TECHNOLOGIES INC

发明人： DESIMONE JOSEPH M ,  ROLLAND JASON P ,  EXNER ANSLEY E ,  SAMULSKI EDWARD T ,  SAMULSKI R JUDE ,  MAYNOR BENJAMIN W ,  EULISS LARKEN E ,  ROTHROCK GINGER DENISON ,  GRATTON STEPHANIE ,  ERMOSH ALEX ,  MURPHY ANDREW JAMES

IPC分类号： G06F15/16 ,  A61K9/51 ,  B82Y10/00

CPC分类号： A61K9/0097 ,  A61K9/1694 ,  A61K9/5115 ,  A61K9/5138 ,  A61K9/5192 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10T428/2982 ,  Y10T428/2991

摘要： Nano-particles are molded in nano-scale molds fabricated from non-wetting, low surface energy polymeric materials. The nano-particles can include pharmaceutical compositions, taggants, contrast agents, biologic drugs, drug compositions, organic materials, and the like. The molds can be virtually any shape and less than 10 micron in cross-sectional diameter.

摘要翻译： 纳米颗粒在由非润湿的低表面能聚合材料制成的纳米级模具中成型。 纳米颗粒可以包括药物组合物，贴剂，造影剂，生物药物，药物组合物，有机材料等。 模具可以是几乎任何形状，并且截面直径小于10微米。

公开(公告)号：EP1704585A4

公开(公告)日：2010-08-18

申请号：EP04821787

申请日：2004-12-20

申请人： UNIV NORTH CAROLINA ,  UNIV NORTH CAROLINA STATE

发明人： DESIMONE JOSEPH M ,  ROLLAND JASON P ,  EXNER ANSLEY E ,  SAMULSKI EDWARD T ,  SAMULSKI R JUDE ,  MAYNOR BENJAMIN W ,  EULISS LARKEN E ,  DENISON GINGER M

IPC分类号： H01L21/302 ,  A61K9/00 ,  A61K9/51 ,  B81C99/00 ,  G03F7/00 ,  H01L21/02 ,  H01L51/00 ,  H01L51/40

CPC分类号： A61K9/14 ,  A61K9/0097 ,  A61K9/5138 ,  A61K9/5153 ,  A61K9/5192 ,  A61K47/34 ,  B81C99/0085 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L51/0004 ,  H01L51/0021 ,  Y10T428/24273 ,  Y10T428/24479 ,  Y10T428/3154

摘要： The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.