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    A PROCESS AND A DEVICE TO CLEAN SUBSTRATES
    1.
    发明公开
    A PROCESS AND A DEVICE TO CLEAN SUBSTRATES 有权
    方法和设备清洁的衬底

    公开(公告)号：EP2244623A1

    公开(公告)日：2010-11-03

    申请号：EP09713364.9

    申请日：2009-01-27

    申请人： Unilever N.V. ,  Unilever PLC

    发明人： JAYARAMAN, Suresh, Sambamurthy ,  KAMKAR, Kirtan, Shravan ,  KUMAR, Lalit ,  SAH, Amit ,  SHRESTH, Rudra, Saurabh

    IPC分类号： A47L11/34 ,  A47L13/26 ,  B05B7/06 ,  B05B7/08 ,  B08B3/02

    CPC分类号： A47L13/26 ,  A47L11/34 ,  A47L11/36 ,  B05B7/065 ,  B05B7/0807 ,  B08B3/02

    摘要： In particular a porous substrate (FS) like a fabric. Process to clean a substrate, comprising a step of subjecting the substrate to an air-water spray (SPR), generated using a spraying means (N) comprising an air passage (OPA) and a water passage (OPW), wherein air is greater than 90% by volume of the spray, the air velocity is greater than 80 m/s and wherein said air passage does not coaxially surround said water passage. Device to clean soiled fabric (FS) comprising a feed water container (CW) and an air compressor (AC) in fluid communication with a spray nozzle (N) comprising an air passage and a water passage, said device being capable of generating an air pressure in the range of 1 to 3 bar (absolute) and an air velocity greater than 80 m/s at the exit of said nozzle; and the air is greater than 90 % volume of said spray, and wherein said air passage does not coaxially surround said water passage. An external mix spray nozzle is especially preferred in the device.