公开(公告)号：EP1498512A4

公开(公告)日：2006-12-20

申请号：EP02796468

申请日：2002-11-06

申请人： YOSHIDA HIDEO

发明人： YOSHIDA HIDEO ,  SATO NOBUYOSHI ,  SAKO TAKESHI ,  SONE MASATO ,  ABE KENTARO ,  SAKON KIYOHITO

IPC分类号： C23G3/00 ,  B08B3/02 ,  B08B3/04 ,  B08B7/02 ,  C25D5/34 ,  C23D1/02 ,  B08B3/08 ,  C23D3/00 ,  C23D5/00

CPC分类号： B08B3/04 ,  B08B3/02 ,  B08B7/02 ,  C25D5/34 ,  Y10S134/902

摘要： A method and a system for activating the surface of a parent material suitable for pretreatment in electrochemical treatment, e.g. electroplating, in which productivity can be enhanced while reducing the facility cost by performing degreasing and removal of an oxide film on the surface of the parent material simultaneously, efficiently and rationally using an inexpensive safety solution, and waste liquid can be reused and environmental contamination can be prevented by rationalizing waste liquid treatment. The method for activating the surface of a parent material is used for degreasing and removing an oxide film on the surface of a material to be treated. A solution for removing an oxide film having a specified acidity is prepared by dissolving pressurized carbon dioxide into a specified quantity of water.