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    FILTER, METHOD FOR PRODUCING SAME, DRY ETCHING APPARATUS AND DRY ETCHING METHOD
    1.
    发明公开
    FILTER, METHOD FOR PRODUCING SAME, DRY ETCHING APPARATUS AND DRY ETCHING METHOD 审中-公开

    公开(公告)号：EP3437709A1

    公开(公告)日：2019-02-06

    申请号：EP17774353.1

    申请日：2017-03-15

    申请人： Zeon Corporation

    发明人： HYAKUTAKE Munehiro ,  HIRANO Takaaki

    IPC分类号： B01D39/14 ,  C07C17/42 ,  C07C19/08

    摘要： The present disclosure provides a filter that includes a portion that comes into contact with a filtering object and is at least partially made of metal or metal compound, wherein the filter is capable of suppressing decomposition of fluorinated saturated hydrocarbon when filtering a composition containing high concentration of fluorinated saturated hydrocarbon. The filter according to the present disclosure includes: an area made of metal or metal compound for coming into contact with the filtering object; and amine compound absorbed to a surface of the area. A method for producing a filter according to the present disclosure includes a step of bringing amine compound into contact with the surface of the area made of metal or metal compound for coming into contact with the filtering object.