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1.
公开(公告)号:EP2576220A1
公开(公告)日:2013-04-10
申请号:EP10728654.4
申请日:2010-06-28
CPC分类号: B41F16/00 , B41F19/062 , B41F21/10 , B41F23/0443 , B41F23/08 , B41M1/24
摘要: The invention relates to a method and a device for generating a structured layer on a sheet material in a processing machine. The aim of the invention is to improve a method and a device such that the machine can be used in a more flexible manner. The aim is achieved in that, in an application unit (B) formed by the film transfer unit, a paint layer is arranged on a substrate on the surface-deforming device having a pressing gap (10), in which a structured layer is pressed on the substrate coated with the paint layer. The pressing operation is carried out only at the counter pressure cylinder (2) and the further cylinder (1, 30). Following the pressing gap (10), the structured layer and the substrate coated with the paint layer can be transported during a dry radiation operation synchronously with the counter pressure cylinder (2). The structured surface is then separated from the substrate in a discharge gap (11) and transported away.