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    LAYER CONFIGURATION WITH IMPROVED STABILITY TO SUNLIGHT EXPOSURE
    3.
    发明授权
    LAYER CONFIGURATION WITH IMPROVED STABILITY TO SUNLIGHT EXPOSURE 有权

    公开(公告)号：EP2079792B2

    公开(公告)日：2018-09-12

    申请号：EP07822095.1

    申请日：2007-10-31

    申请人： Agfa-Gevaert N.V.

    发明人： LOUWET, Frank ,  BOLLENS, Louis

    IPC分类号： C08K5/13 ,  C08L65/00 ,  H01G9/02 ,  H01G11/48

    CPC分类号： C08K5/13 ,  H01G9/028 ,  H01G11/48 ,  Y02E60/13 ,  C08L45/00

    摘要： A composition exclusive of hydroquinone comprising at least one polymer comprising (3,4-dialkoxythiophene) monomer units, in which the two alkoxy groups may be the same or different or together represent an optionally substituted oxy-alkylene-oxy bridge, a polyanion, at least one aromatic compound exclusive of sulfo groups and containing at least two hydroxy groups and at least one polyhydroxy- and/or carboxy group or amide or lactam group containing aliphatic compound and/or at least one aprotic compound with a dielectric constant >=15; and a layer configuration on a support, said layer configuration comprising a layer exclusive of hydroquinone comprising at least one polymer comprising optionally substituted (3,4-dialkoxythiophene) monomer units, in which the two alkoxy groups may be the same or different or together represent an optionally substituted oxy-alkylene-oxy bridge, a polyanion, at least one aromatic compound exclusive of sulfo groups and containing at least two hydroxy groups and at least one polyhydroxy- and/or carboxy group or amide or lactam group containing aliphatic compound and/or at least one aprotic compound with a dielectric constant >=15.

    SECURITY LAMINATES WITH INTERLAMINATED TRANSPARENT EMBOSSED POLYMER HOLOGRAM
    7.
    发明公开
    SECURITY LAMINATES WITH INTERLAMINATED TRANSPARENT EMBOSSED POLYMER HOLOGRAM 有权
    安全性层压板与透明压印之间的换挡聚合物全息图

    公开(公告)号：EP2203305A1

    公开(公告)日：2010-07-07

    申请号：EP08804435.9

    申请日：2008-09-19

    申请人： Agfa-Gevaert N.V.

    发明人： GEUENS, Ingrid

    IPC分类号： B32B3/30 ,  B32B27/14 ,  B42D15/10 ,  G09F3/02 ,  G03H1/02 ,  C09J5/02

    CPC分类号： C09J5/02 ,  B32B7/12 ,  B32B27/08 ,  B32B2307/5825 ,  B42D25/328 ,  C09J2400/123 ,  G03H1/0011 ,  G03H1/02 ,  G03H1/0244 ,  G03H1/0256 ,  G03H1/028 ,  G03H2240/50 ,  G03H2240/54 ,  G03H2250/35 ,  G03H2250/36 ,  Y10T156/10

    摘要： A method for interlaminating an embossed hologram, the embossed hologram comprising an optionally transparent support having two sides, at least one of the two sides either itself being embossed or having a layer thereon which is embossed and a layer of a HRI- material contiguous with the embossed side or embossed layer, comprising the steps of : a) conditioning the outermost surface of the layer of inorganic HRI- material with an alkaline solution or an acidic solution; b) drying the outermost surface of the layer of the inorganic HRI- material thereby providing a conditioned outermost surface of the layer of inorganic HRI-material; c) applying a layer of an adhesive composition to the conditioned outermost surface of the layer of inorganic HRI-material support; and d) laminating the outermost surface of the layer of HRI-material to a polymer film, wherein at least one of the support and the polymer film is transparent; and wherein the HRI material is a material with a refractive index of at least 0.3 higher than that of the embossed material. A laminate obtainable therewith, and a security document comprising the laminate are also disclosed.

    METHOD FOR SLOT EXTRUSION COATING A LIQUID COMPOSITION
    8.
    发明公开
    METHOD FOR SLOT EXTRUSION COATING A LIQUID COMPOSITION 有权
    方法SLOT挤出涂层的液体组合物

    公开(公告)号：EP1917109A1

    公开(公告)日：2008-05-07

    申请号：EP06777299.6

    申请日：2006-06-12

    申请人： AGFA-GEVAERT N.V.

    发明人： MUES, Willem AGFA-GEVAERT

    IPC分类号： B05D1/26

    CPC分类号： G03C1/74 ,  B05C5/0254 ,  B05D1/265 ,  B05D3/0493 ,  G03C1/04 ,  G03C1/49854 ,  G03C1/49863 ,  G03C1/4989 ,  G03C2001/7459

    摘要： A method for slot extrusion coating a liquid composition at a coating temperature and a coating speed at or above 40 m/min, said liquid composition having a viscosity at said coating temperature of at least 500 mPa.s at a shear rate of 100 s -1 , comprising the step of : (i) selecting said liquid composition for slot extrusion coating having a tan d of less than 1000 measured by oscillatory dynamic viscosity measurements at 1 Hz, the coating temperature and a shear stress of 250 Pa under conditions in which there is effectively no variation in shear stress within said liquid composition during said measurement, said liquid composition being selected from liquid compositions each comprising at least one binder and a liquid carrier medium; and (ii) slot extrusion coating the composition via a slot onto a web support with a bead vacuum at the coating temperature and the coating speed.

    Method for processing lithographic printing plates
    9.
    发明公开
    Method for processing lithographic printing plates 有权
    Verfahren zur Verarbeitung von Flachdruckplatten

    公开(公告)号：EP1722275A1

    公开(公告)日：2006-11-15

    申请号：EP05103879.2

    申请日：2005-05-10

    申请人： AGFA-GEVAERT N.V.

    发明人： Gries, Willi - Kurt ,  Van Damme, Marc c/o AGFA-GEVAERT, Corp IP ,  Boxhorn, Mario, c/o AGFA-GEVAERT, Corp. IP ,  Meeus, Pascla c/o AGFA-GEVAERT, Corp. IP

    IPC分类号： G03F7/32

    CPC分类号： G03F7/322

    摘要： The invention relates to a method of making a lithographic printing plate comprising the steps of providing a photopolymer printing plate precursor that is photopolymerizable upon absorption of light in the wavelength range from 300 to 700 nm, exposing said printing plate precursor with light in the range from 300 to 700 nm and processing said exposed precursor with an aqueous alkaline developer, characterized in that the alkaline developer comprises a polyethyleneoxide/polypropyleneoxide surfactant having a specific composition. The method leads to less depositions in the developing apparatus and on the processed printing plates and the developer used has an increased sedimentation stability.

    摘要翻译： 本发明涉及一种制备平版印刷版的方法，该方法包括以下步骤：提供在吸光度在300至700nm波长范围内可光聚合的光聚合物印版前体，将所述印版前体用 300至700nm，并用含水碱性显影剂处理所述暴露的前体，其特征在于碱性显影剂包含具有特定组成的聚环氧乙烷/聚丙烯氧化物表面活性剂。 该方法导致显影装置和加工印刷版上的沉积少，并且所使用的显影剂具有增加的沉降稳定性。