公开(公告)号：EP0991941A1

公开(公告)日：2000-04-12

申请号：EP97932292.2

申请日：1997-06-25

申请人： INSTROMET, INC.

发明人： VANDER HEYDEN, William, H. ,  BERG, Ronald, Arthur

IPC分类号： G01N33/22

CPC分类号： G01N25/22 ,  G01N25/32 ,  G01N33/225

摘要： The heating value of a sample gas is calculated by a microcontroller (12) from the heating value of a reference gas, and from flow ratios and power levels determined as the gas is combusted by a flameless combustion process. The combustible gas is mixed with a combustion supporting gas, such as air, and flowed to a body of material (26, 52) which is heated to a temperature sufficient for oxidation of the gas mixture. The size of spaces in a first embodiment of a heater device (9, 11, 25, 26) and in a second embodiment of a heater device (50) are limited to prevent formation of an open flame. In a preferred 'lean mixture' embodiment, the gas-air mixture of the reference gas, and the gas-air mixture of the sample gas, respectively, are each adjusted until a selected power level of combustion at a temperature lower than the point of stoichiometric combustion is reached. In a second, 'rich mixture' embodiment, the gas-air mixture of the reference gas, and the gas-air mixture of the sample gas, respectively, are each adjusted from a 'rich mixture' to reach a point of stoichiometric combustion. Based on flow rates and the selected power ratio, the heating value of the sample gas is calculated by the microcontroller (12) and output to a visual display or other output device.

公开(公告)号：EP1051605A1

公开(公告)日：2000-11-15

申请号：EP99902976.2

申请日：1999-01-13

申请人： INSTROMET, INC.

发明人： VANDER HEYDEN, William, H.

IPC分类号： G01N9/26 ,  G01N9/32

CPC分类号： G01N9/266 ,  G01N9/32

摘要： The relative density of a sample of a supply gas under test is determined by measuring an atmospheric pressure and a pressure differential for the reference gas and the sample gas as each is passed through a small orifice (16) with smooth walls, such as a pore formed in a sapphire jewel. The pressure measurements are made on a time base determined during the reference gas cycle. A microcontroller (15) them computes a relative density for the sample gas based on a known relative density for the reference gas and a ratio of pressure factors for the sample gas and the reference gas in a system operating at in a range from 1 to about 6 psig.

公开(公告)号：EP0608736B1

公开(公告)日：2000-08-16

申请号：EP94100557.1

申请日：1994-01-15

申请人： INSTROMET, INC.

发明人： Vander Heyden, William H.

IPC分类号： G01F15/04 ,  G01F1/86 ,  G01N33/22 ,  G01F15/02 ,  G01N9/26

CPC分类号： G01N1/2247 ,  G01F5/00 ,  G01F5/005 ,  G01F15/046 ,  G01N9/00