METHOD AND APPARATUS FOR BI-PLANAR BACKWARD WAVE OSCILLATOR
    1.
    发明公开
    METHOD AND APPARATUS FOR BI-PLANAR BACKWARD WAVE OSCILLATOR 审中-公开
    方法和装置双翼飞机返波管

    公开(公告)号:EP1661239A4

    公开(公告)日:2008-07-02

    申请号:EP04781043

    申请日:2004-08-12

    发明人: DAYTON JAMES A JR

    摘要: The present invention is directed in one aspect to methods of making free-standing, internally-supported, three-dimensional objects having an outer surface comprising a plurality of intersecting facets wherein a sub-set of the intersecting facets have a diamond layer of substantially uniform thickness. The diamond layer may be formed by chemical vapor deposition (CVD) over the surface of a substrate that has been fabricated to form a mold defining the sub-set of intersecting facets. A backing layer may be formed over at least a portion of the exposed diamond layer to enhance the rigidity of the layer when the substrate is removed.

    METHOD AND APPARATUS FOR BI-PLANAR BACKWARD WAVE OSCILLATOR
    2.
    发明公开
    METHOD AND APPARATUS FOR BI-PLANAR BACKWARD WAVE OSCILLATOR 审中-公开
    方法和装置双翼飞机返波管

    公开(公告)号:EP1661239A2

    公开(公告)日:2006-05-31

    申请号:EP04781043.7

    申请日:2004-08-12

    IPC分类号: H03B9/08 H01J25/40

    摘要: The present invention is directed in one aspect to methods of making free-standing, internally-supported, three-dimensional objects having an outer surface comprising a plurality of intersecting facets wherein a sub-set of the intersecting facets have a diamond layer of substantially uniform thickness. The diamond layer may be formed by chemical vapor deposition (CVD) over the surface of a substrate that has been fabricated to form a mold defining the sub-set of intersecting facets. A backing layer may be formed over at least a portion of the exposed diamond layer to enhance the rigidity of the layer when the substrate is removed.