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    CONTROL DEVICE FOR CONTROLLING THE OPERATIONAL EFFICIENCY OF AN IRRADIATION BEAM EMITTING DEVICE AND METHOD FOR CONTROLLING THE OPERATIONAL EFFICIENCY OF SAID IRRADIATION BEAM EMITTING DEVICE
    3.
    发明公开
    CONTROL DEVICE FOR CONTROLLING THE OPERATIONAL EFFICIENCY OF AN IRRADIATION BEAM EMITTING DEVICE AND METHOD FOR CONTROLLING THE OPERATIONAL EFFICIENCY OF SAID IRRADIATION BEAM EMITTING DEVICE 审中-公开

    公开(公告)号：EP4506965A2

    公开(公告)日：2025-02-12

    申请号：EP24188825.4

    申请日：2024-07-16

    Applicant: Tetra Laval Holdings & Finance S.A.

    Inventor： CLOETTA, Dominique ,  WANDFLUH, Wilhelm

    IPC: G21K5/00 ,  H01J41/04

    Abstract: It is disclosed a control device (1) for controlling the operational efficiency of an irradiation beam emitting device (2), wherein the irradiation beam emitting device (2) comprises a vacuum chamber (13), a filament (4) configured to emit electrons by thermionic effect, when heated, a first electrical conductor (6) and a second electrical conductor (5), said filament (4), first conductor (6) and second conductor (5) being placed inside the vacuum chamber (13),
    the control device (1) comprising:
    - a power supply (9) connectable to the filament (4), to the first conductor (6) and to the second conductor (5) to supply power to the filament (4), to the first conductor (6), and to the second conductor (5);
    - a sensing unit (11) comprising at least a first sensor (7) configured to detect at least an electric parameter associated to a current flowing through the first conductor (6), defined as ionization current (IC), and a second sensor (8) configured to detect at least an electric parameter associated to a current flowing through the second conductor (5), defined as an emission current (EC);
    - a control unit (10) coupled to the sensing unit (11) to receive the detected electric parameters and to the power supply (9) and further configured for actuating a main control mode (F1) of the status of the irradiation beam emitting device (2) comprising:
    - adjusting the power supply (9) to apply on the filament (4) a predetermined current to emit electrons;
    - adjusting the power supply (9) to apply a predetermined voltage on the first conductor (6);
    - adjusting the power supply (9) to apply a predetermined voltage on the second conductor (5);
    - deriving at least a status parameter representing an operational efficiency of the irradiation beam emitting device (2) as a function of the detected electric parameter associated to the ionization current (IC) and of the detected electric parameter associated to the emission current (EC).

    SYSTEMS AND METHODS FOR INTERACTING WITH A MATTER PARTICLE
    5.
    发明公开
    SYSTEMS AND METHODS FOR INTERACTING WITH A MATTER PARTICLE 审中-公开

    公开(公告)号：EP4489028A1

    公开(公告)日：2025-01-08

    申请号：EP23306150.6

    申请日：2023-07-07

    Applicant: Pasqal

    Inventor： DREON, Davide ,  FAVIER, Pierre ,  NGUYEN, Catherine

    IPC: G21K1/00 ,  G02F1/33 ,  G06N10/40

    Abstract: There is presented, a system (2) for forming a plurality of focussed electromagnetic, EM, radiation regions, for interacting with one or more matter particles; the matter particles act as qubits in a quantum computation. The system comprising: I) a source assembly (8) comprising a plurality of emitters (10) wherein each emitter is configured to generate and output EM radiation (12); the plurality of emitters comprising at least a first emitter and a second emitter; the source assembly configured to independently change the intensity of EM radiation output from the assembly from the first emitter and the second emitter; II) a focussing assembly comprising one or more EM focussing elements; the focussing assembly configured to focus EM radiation to form: a first focussed EM region, of the plurality of EM regions (14), using EM radiation output from the first emitter; a second focussed EM region, of the plurality of EM regions, using EM radiation output from the second emitter. The first EM region occupying a different portion of space to the second EM region; wherein: a) the source assembly is configured such that the first and second emitters are upon a unitary device; and/or, b) the EM regions form one or more traps for the matter particles.

    SYSTEMS AND METHODS FOR INTERACTING WITH A MATTER PARTICLE
    6.
    发明公开
    SYSTEMS AND METHODS FOR INTERACTING WITH A MATTER PARTICLE 审中-公开

    公开(公告)号：EP4489027A1

    公开(公告)日：2025-01-08

    申请号：EP23306149.8

    申请日：2023-07-07

    Applicant: Pasqal

    Inventor： DREON, Davide ,  FAVIER, Pierre ,  NGUYEN, Catherine

    IPC: G21K1/00 ,  G02F1/33 ,  G06N10/40

    Abstract: There is presented a system (500) for forming electromagnetic, EM, radiation for interacting with a plurality of matter particles (504) in an interaction region (516). The matter particles acting as qubits in a quantum computation. The system comprising: a plurality of EM emitters (506, 506a, 506b) for generating EM radiation (508a, 508b), the system configured to form an EM intensity distribution (514a, 514b) of the EM radiation in the interaction region for each of the EM emitters; the plurality of EM emitters comprises: i) a first set of two or more of the plurality of EM emitters associated with a first matter particle of the plurality of matter particles; and ii) further EM emitters associated with one or more different matter particles to the first matter particle. The system is further configured such that the EM radiation generated by each of the EM emitters of the first set forms an intensity distribution covering a different portion of the interaction region to the EM distributions of: a) the other EM emitters within the first set; and b) the further EM emitters.

    REACTOR AND METHOD FOR DEPOSITING ATOMIC LAYERS AND FOR FABRICATING FRESNEL ZONE PLATES
    7.
    发明公开
    REACTOR AND METHOD FOR DEPOSITING ATOMIC LAYERS AND FOR FABRICATING FRESNEL ZONE PLATES 审中-公开

    公开(公告)号：EP4477777A1

    公开(公告)日：2024-12-18

    申请号：EP23178911.6

    申请日：2023-06-13

    Applicant: deepXscan GmbH

    Inventor： Zschech, Ehrenfried ,  Richter, Matthias ,  Feser, Michael

    IPC: C23C16/455 ,  C23C16/458 ,  C23C16/44 ,  C23C16/46 ,  G21K7/00 ,  G02B3/08 ,  G02B5/18 ,  G21K1/06 ,  C23C16/02

    Abstract: The present invention relates to a reactor and to a method for depositing one or more atomic layers of at least one material onto a substrate. The reactor comprises a reaction chamber accommodating a showerhead, a base stage and at least one substrate holder. The showerhead comprises at least one gas outlet that is configured for providing a gas stream of the at least material or of at least one component of the at least one material. The base stage is rotatable around a base stage rotation axis. The at least one substrate holder is arranged on the base stage and configured for rotating the substrate around a substrate rotation axis. In particular, the substrate holder is configured for rotating the substrate around a substrate rotation axis in such a way that the base stage rotation axis and the substrate rotation axis are inclined with respect to each other. The present invention also relates to an X-ray microscope for producing a magnified image of an object using X-rays.

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