公开(公告)号：JP2013196862A

公开(公告)日：2013-09-30

申请号：JP2012060961

申请日：2012-03-16

Applicant: Hitachi High-Tech Science Corp ,  株式会社日立ハイテクサイエンス

Inventor： SUGIYAMA YASUHIKO ,  ASAHATA TATSUYA ,  DOI TOSHIO ,  OBA HIROSHI

IPC: H01J37/317 ,  H01J37/12

CPC classification number: H01J3/14 ,  H01J37/304 ,  H01J2237/0458 ,  H01J2237/30433 ,  H01J2237/30472 ,  H01J2237/31749

Abstract: PROBLEM TO BE SOLVED: To provide a focused ion beam device capable of easily and precisely setting a focusing voltage.SOLUTION: A control terminal records calculated values of focusing voltages with which reference beam currents Athrough Aare obtained for all apertures #1 through #5 in a focusing voltage table in advance. The control terminal obtains an experimental value of the focusing voltage with which the reference beam current Ais obtained for the reference aperture #1. The control terminal obtains a correction value for the focusing voltage by subtracting the recorded calculated value for the reference aperture #1 from the experimental value. The control terminal obtains set values of the focusing voltages by adding respective correction values to the calculated values recorded for all the apertures #1 through #5, and records the resulting values in the focusing voltage table.

Abstract translation: 要解决的问题：提供能够容易且精确地设定聚焦电压的聚焦离子束装置。解决方案：控制端子记录所有孔＃1至＃5获得的参考光束电流A A的聚焦电压的计算值 一个聚焦电压表提前。 控制端子获得参考光圈电流Ais获得的参考光圈＃1的聚焦电压的实验值。 控制端子从实验值中减去参考光圈＃1的记录计算值，从而获得聚焦电压的校正值。 控制终端通过将针对所有孔＃1至＃5记录的计算值相加各自的校正值来获得聚焦电压的设定值，并将得到的值记录在聚焦电压表中。