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公开(公告)号:JP3604596B2
公开(公告)日:2004-12-22
申请号:JP24744999
申请日:1999-09-01
Applicant: 株式会社林原生物化学研究所 , 株式会社豊田中央研究所
IPC: C07D491/16 , C09K11/06 , H01L51/50 , H05B33/14
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公开(公告)号:JP3941627B2
公开(公告)日:2007-07-04
申请号:JP2002229914
申请日:2002-08-07
Applicant: 株式会社豊田中央研究所
IPC: B32B9/00 , G02F1/1333 , C23C16/30
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公开(公告)号:JP4258160B2
公开(公告)日:2009-04-30
申请号:JP2002082037
申请日:2002-03-22
Applicant: 株式会社豊田中央研究所
CPC classification number: H01L51/5253 , H01L51/5256
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5.
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公开(公告)号:JP4400636B2
公开(公告)日:2010-01-20
申请号:JP2007051748
申请日:2007-03-01
Applicant: 株式会社豊田中央研究所
IPC: C23C16/42 , C23C16/50 , H01L21/318 , H01L21/768 , H01L23/522 , H01L51/50 , H05B33/04
CPC classification number: H01L21/3185 , H01L51/5253 , H01L51/5256 , H01L2251/5346 , H01L2251/55
Abstract: A barrier film formed on top of a substrate, a barrier film formed so as to cover a functional element region fabricated on top of a substrate, or a barrier film formed on both a substrate and a functional element region, wherein the barrier film includes at least one layer of a silicon nitride film formed by laminating two or more silicon nitride layers having different Si/N composition ratios.
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