公开(公告)号：JP2012138411A

公开(公告)日：2012-07-19

申请号：JP2010288341

申请日：2010-12-24

申请人： Canon Anelva Corp ,  キヤノンアネルバ株式会社

发明人： IORI KAZUYUKI ,  NAKAGAWA KOJIN

IPC分类号： H01L21/3065 ,  H05H1/46

摘要： PROBLEM TO BE SOLVED: To provide a plasma processing apparatus equipped with an adhesion-preventing shield which is capable of plasma ignition without installing separate plasma ignition means, which inhibits a high-frequency antenna from capacitively coupling with plasma, and which suppresses the deterioration of RF power transmission efficiency to a discharge space caused when a dielectric wall is covered with a conductive etching product.SOLUTION: The plasma processing apparatus includes: at least double adhesion-preventing shields arranged inside the dielectric wall of a plasma generating chamber. The adhesion-preventing shields includes a dielectric-made adhesion-preventing shield which is provided on a vacuum side close to the dielectric wall of a vacuum vessel and formed so as to cover the dielectric wall, and a metallic adhesion-preventing shield which acts as a shield electrode to be provided inside the adhesion-preventing shield and has a slit shape in order to prevent the RF power transmission from being lowered by cutting connection of films formed by the etching product.

摘要翻译： 要解决的问题：提供一种配备有能够等离子体点火的等离子体防护罩的等离子体处理装置，而不需要安装分开的等离子体点火装置，这种等离子体点火装置抑制高频天线与等离子体的电容耦合，并且抑制 当电介质壁被导电蚀刻产物覆盖时，RF功率传输效率降低到放电空间。 解决方案：等离子体处理装置包括：布置在等离子体产生室的电介质壁内部的至少两个防粘附防护屏障。 防粘附防护罩包括电绝缘防粘屏蔽层，其设在靠近真空容器电介质壁的真空侧并形成以覆盖电介质壁;以及金属防粘保护层，其作为 屏蔽电极设置在防粘附屏蔽内部并且具有狭缝形状，以便通过切割由蚀刻产物形成的膜的连接来防止RF功率传输降低。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011034705A

公开(公告)日：2011-02-17

申请号：JP2009177406

申请日：2009-07-30

申请人： Canon Anelva Corp ,  キヤノンアネルバ株式会社

发明人： IORI KAZUYUKI ,  NAKAGAWA KOJIN

IPC分类号： H05H1/46 ,  C23C14/35 ,  C23C16/509

摘要： PROBLEM TO BE SOLVED: To provide a plasma treatment device capable of forming uniform high-density plasma at low pressure over a large area. SOLUTION: The device uses a cylindrical electrode as one in a plasma generating room opposed to a treatment substrate and arranges a magnetic field generating device at an atmosphere side for generating a point cusp magnetic field. Otherwise, one end of the cylindrical electrode is closed, and permanent magnets are arranged outside the closed site in a state of a ring so as directions of magnetic poles to be alternated and coaxial. COPYRIGHT: (C)2011,JPO&INPIT

摘要翻译： 解决的问题：提供能够在大面积上在低压下形成均匀的高密度等离子体的等离子体处理装置。 解决方案：该装置在与处理基板相对的等离子体发生室中使用圆柱形电极，并在大气侧布置磁场产生装置，以产生点尖点磁场。 否则，圆筒形电极的一端封闭，并且永久磁铁以环状的状态布置在封闭位置的外侧，以使得要交替和同轴的磁极方向。 版权所有（C）2011，JPO＆INPIT