公开(公告)号：JPH0473429B2

公开(公告)日：1992-11-20

申请号：JP2133185

申请日：1985-02-06

申请人： NIPPON ZEON CO

发明人： MATSUNO SHUGO ,  GOTO KUNIAKI

IPC分类号： C07D209/08

公开(公告)号：JPH0262549B2

公开(公告)日：1990-12-26

申请号：JP8389584

申请日：1984-04-27

申请人： NIPPON ZEON CO

发明人： GOTO KUNIAKI ,  MATSUNO SHUGO

IPC分类号： C07D209/08

公开(公告)号：JPS63170383A

公开(公告)日：1988-07-14

申请号：JP4373287

申请日：1987-02-26

申请人： NIPPON ZEON CO ,  TAISHO PHARMA CO LTD

发明人： MOCHIZUKI NAOKI ,  MATSUNO SHUGO ,  GOTO KUNIAKI ,  HOSODA KAZUAKI ,  KOTOMO SUSUMU ,  AIHARA HIROKAZU

IPC分类号： C07D491/18 ,  A61K31/40 ,  A61P1/16

摘要： NEW MATERIAL:A compound expressed by formula I (n is 1-5). EXAMPLE:N-(3-Fluorophenyl)-7-oxabicyclo[2.2.1] hept-5-ene-2,3,-dicarboximide. USE:A remedy for liver diseaes, for example, jecur adiposum, alcoholic hepatitis, toxic hepatopathy, hemostatic liver, cholestatic hepatopathy, hepatocirrhosis, etc. PREPARATION:For example, a compound expressed by formula II (example; 3-fluoroaniline, etc.) and 3,6-endooxo-1,2,3,6-tetrahydrophthalic anhydride are subjected to condensation reaction with dehydration preferably n the presence of a solvent such as acetic acid, etc., suitably at 50-150 deg.C for 30min-5hr while heating.

公开(公告)号：JPH08137107A

公开(公告)日：1996-05-31

申请号：JP30155894

申请日：1994-11-10

申请人： NIPPON ZEON CO

发明人： MATSUNO SHUGO ,  SUGIMOTO TATSUYA ,  ABE NOBUNORI ,  TANAKA HIDEYUKI

IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027

摘要： PURPOSE: To improve resist characteristics such as light transmissivity, sensitivity, resolution and etching resistance, etc., by incorporating a polymer containing a specific structural unit and a radiosensitive component producing an acid by being irradiated with activated radioactive ray. CONSTITUTION: This resist composition contains the polymer containing the structural unit expressed by formulae I-III and the radiosensitive component producing the acid by being irradiated with activated radioactive ray. In formulae I-III, each of R -R is individually hydrogen atom, 1-4C substitutable alkyl group, halogen atom, cyano group or nitro group, each of R and R is individually hydrogen atom, 1-8C linear, branched or cyclic substitutable alkyl group, substitutable alkenyl group or substitutable aryl group, Adm is a 1-adamantyl group and R is an acid unstable group. In each formula, (k), (m) and (n) respectively represent the ratio of each structural unit and are 0.05

公开(公告)号：JPH0829985A

公开(公告)日：1996-02-02

申请号：JP18783394

申请日：1994-07-18

申请人： NIPPON ZEON CO

发明人： MATSUNO SHUGO ,  ABE NOBUNORI ,  WADA YASUMASA

IPC分类号： G03F7/004 ,  G03F7/023 ,  G03F7/039 ,  H01L21/027

摘要： PURPOSE:To provide the new radiation sensitive resist composition. CONSTITUTION:This resist composition is the radiation sensitive composition, which contains resin binder and acid generating agent. The resin binder is made of phenol group resin, in which hydrogen atom of a part of the hydroxyl group is replaced with at least one group expressed with the formula (1)- COCOOR or (2)-C (R ) (R ) COCOOR . In the formula (1) and (2), R commonly means alkyl group having 1-10 carbons, alkenyl group, 1-alkoxyalkyl group, substitutional cycloalkyl group, substitutional 2-propenyl group, substitutional cycloalkenyl group, substitutional cycloalkajenyl group, substitutional vinyl group, trialkoxymethyl group, and R , R mean hydrogen atom, halogen atom, alkyl group having 1-5 carbons and cyano group, and they can be the same one or they can be different from each other.

公开(公告)号：JPH0815863A

公开(公告)日：1996-01-19

申请号：JP16998394

申请日：1994-06-29

申请人： NIPPON ZEON CO

发明人： MATSUNO SHUGO ,  ABE NOBUNORI ,  SUGIMOTO TATSUYA

IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027

摘要： PURPOSE:To obtain a new radiation-sensitive resist compsn. by incorporating an acid producing agent and a polymer having a specified structural unit. CONSTITUTION:The resist compsn. contains an acid producing agent and a polymer having the structural unit expressed by formula I. In formula I, R , R , R are independently hydrogen atoms, 1-4C alkyl groups which may have substituents, halogen atoms or cyano groups, R , R are independently hydrogen atoms, or 1-8C straight-chain, branched-chain or cyclic alkyl groups which may have substituents, R is a group expressed by formulae II and III, R is a group expressed by formulae IV, V, VI, and VII, k, (l), m represent mol% of each structural unit in the polymer and satisfy k+(l)+m=1, 0 -R are hydrogen atoms or l-8C straight-chain, branched-chain or cyclic alkyl groups which may have substituents.In formulae IV, V, VI, VII, R -R are hydrogen atoms, 1-8C straight-chain, branched-chain or cyclic alkyl groups which may have substituents.

公开(公告)号：JPH0251430B2

公开(公告)日：1990-11-07

申请号：JP11061183

申请日：1983-06-20

申请人： NIPPON ZEON CO

发明人： MITSUTA YASUHIRO ,  MATSUNO SHUGO ,  GOTO KUNIAKI

IPC分类号： C07D309/30

公开(公告)号：JPH08146610A

公开(公告)日：1996-06-07

申请号：JP30990394

申请日：1994-11-17

申请人： NIPPON ZEON CO ,  FUJITSU LTD

发明人： MATSUNO SHUGO ,  SUGIMOTO TATSUYA ,  TANAKA HIDEYUKI ,  MIYATA SHUICHI

IPC分类号： G03F7/004 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027

摘要： PURPOSE: To provide the resist composition superior in resist characteristics, such as sensitivity and resolution and etching resistance, and especially, excellent in pattern forms and to provide the pattern forming method using this composition. CONSTITUTION: The resist composition contains [A] a polymer comprising structural units each represented by formula I and those represented by formula II, and [B] a radiation sensitive component to be allowed to produce an acid by irradiation with activated radiation, and the pattern is formed by using this composition. In formulae I and II, each of R and R is, independently, an H or halogen atom, or an optionally substituted 1-4C alkyl or cyano or nitro group; each of (m) and (n) is a proportion of each structural unit in the polymer, and when the sum of each structural unit is 1, each of (m) and (n) is as follows; 0.1

公开(公告)号：JPH08101509A

公开(公告)日：1996-04-16

申请号：JP26105494

申请日：1994-09-30

申请人： NIPPON ZEON CO

发明人： MATSUNO SHUGO ,  ABE NOBUNORI ,  WADA YASUMASA

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

摘要： PURPOSE: To provide a resist compsn. excellent in resist characteristics by incorporating a specified polymer and a radiation sensitive component which produces an acid when irradiated with activated radiation. CONSTITUTION: A polymer having constituent units represented by formulae I-III and a radiation sensitive component which produces an acid when irradiated with activated radiation are incorporated. In formulae I-III, each of R -R is H, 1-4C substitutable alkyl, etc., R is straight chain, branched or cyclic 1-8C substitutable alkyl or substitutable alkenyl, each of R and R is H, halogen, etc., R is straight chain, branched or cyclic 1-8C substitutable alkyl or straight chain, branched or cyclic 1-8C substitutable alkenyl, each of R -R is H, halogen, etc., at least one of R -R is H, A is a single bond or a divalent substitutable org. group, (k), (m) and (n) show the ratio among the units represented by formulae I-III, k+m+n=1, 0

公开(公告)号：JPH08101508A

公开(公告)日：1996-04-16

申请号：JP26105394

申请日：1994-09-30

申请人： NIPPON ZEON CO

发明人： MATSUNO SHUGO ,  ABE NOBUNORI ,  SUGIMOTO TATSUYA

IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027

摘要： PURPOSE: To provide a resist compsn. excellent in resist characteristics by incorporating a specified polymer and a radiation sensitive component which produces an acid when irradiated with activated radiation. CONSTITUTION: A polymer having structural units represented by formulae I-III and a radiation sensitive component which produces an acid when irradiated with activated radiation are incorporated. In the formulae I-III, each of R -R is H, 1-4C substitutable alkyl, halogen, cyano, etc., R is a group represented by formula IV, etc., R is straight chain, branched or cyclic 1-8C substitutable alkyl, substitutable alkenyl or substitutable aryl, (k), (m) and (n) show the ratio among the units represented by formulae I-III, k+m+n=1, 0 -R is H, straight chain, branched or cyclic 1-8C substitutable alkyl, etc., and R and R may form a ring by bonding to each other.