公开(公告)号：KR1020090039009A

公开(公告)日：2009-04-22

申请号：KR1020070104392

申请日：2007-10-17

申请人： 한양대학교 산학협력단

发明人： 박진구 ,  임현우 ,  조민수 ,  김규채

IPC分类号： H01L21/027 ,  G03F7/20

CPC分类号： G03F7/0002 ,  B81C1/0046 ,  B82Y40/00 ,  H01L21/02422 ,  H01L21/0272 ,  H01L21/0273 ,  Y10S977/887

摘要： A method for forming a micro pattern on a plastic substrate is provided to prevent generation of a concavo-convex on a surface of a plastic substrate by filling a metal micro pattern in the plastic substrate. A metal thin film is formed on a plastic substrate(1) for forming a metal micro pattern. A metal pattern(9) of a thin film type is formed on the plastic substrate by a photolithography process. A photoresist of a fixed thickness is uniformly coated on the metal thin film. A mask having a fixed pattern is arranged on the photoresist coated on the surface of the metal thin film. An exposure process is performed. The photoresist pattern is formed on the metal thin film by melting the photoresist of a part having a weak coupling force by a developing solution. A micro pattern is formed by etching the metal thin film with the photoresist pattern. The photoresist pattern remaining from the metal micro pattern is removed. An adhesion prevention layer is arranged on a full surface of the plastic substrate including the metal micro pattern. The metal micro pattern is filled with an inner part of the plastic substrate by performing a heating process and a pressurization process.

摘要翻译： 提供了在塑料基板上形成微图形的方法，以通过在塑料基板中填充金属微图案来防止在塑料基板的表面上产生凹凸。 在用于形成金属微图案的塑料基板（1）上形成金属薄膜。 通过光刻工艺在塑料基板上形成薄膜型金属图案（9）。 固定厚度的光致抗蚀剂均匀地涂覆在金属薄膜上。 具有固定图案的掩模布置在涂覆在金属薄膜表面上的光致抗蚀剂上。 进行曝光处理。 通过用显影液熔化具有弱耦合力的部分的光致抗蚀剂，在金属薄膜上形成光致抗蚀剂图案。 通过用光致抗蚀剂图案蚀刻金属薄膜形成微图案。 去除从金属微图案残留的光刻胶图案。 在包括金属微图案的塑料基板的整个表面上设置防粘附层。 金属微图案通过进行加热处理和加压处理而填充塑料基板的内部。

公开(公告)号：KR1020090035936A

公开(公告)日：2009-04-13

申请号：KR1020070100983

申请日：2007-10-08

申请人： 재단법인서울대학교산학협력재단

发明人： 이규백

IPC分类号： H01L21/027

CPC分类号： G03F7/0002 ,  B81C1/0046 ,  B82Y40/00 ,  Y10S977/887

摘要： A method for forming functional nano pattern is provided to directly apply specific functions to 3D surface-modified nano pattern. A method for forming functional nano pattern is characterized by activating surface of nano structure having nano-sized protrusions in order to be covalently bonded with organic materials and contacting a stamp(100) coated with organic materials to the nano structure surface so as to immobilize the organic materials by the nano-sized protrusions. A substrate(102) having nano structure with nano-sized protrusions is transferred by a nano imprint method using intaglio structure of anodized aluminum oxide. The method for activating the surface of the substrate is processed through a plasma treatment. The plasma treatment represents oxygen plasma or ammonia plasma.

摘要翻译： 提供形成功能纳米图案的方法，以直接将特定功能应用于3D表面改性纳米图案。 用于形成功能性纳米图案的方法的特征在于激活具有纳米尺寸突起的纳米结构的表面，以便与有机材料共价键合，并将涂覆有机材料的印模（100）接触到纳米结构表面，以便固定 有机材料通过纳米尺寸的突起。 具有纳米尺寸突起的纳米结构的衬底（102）通过使用阳极化氧化铝的凹版结构的纳米压印法转移。 通过等离子体处理来处理激活基板表面的方法。 等离子体处理表示氧等离子体或氨等离子体。

公开(公告)号：KR1020090031978A

公开(公告)日：2009-03-31

申请号：KR1020080079804

申请日：2008-08-14

申请人： 가부시끼가이샤 도시바

发明人： 키하라,나오꼬 ,  히에다,히로유끼 ,  카마타,요시유끼

IPC分类号： H01L21/027

CPC分类号： G11B5/82 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G11B5/855 ,  B81C1/0046

摘要： A method of forming the pattern is provided to use the imprinting resist layer and to optimally design the pattern according to the shape of the record head etc. The double block copolymer composition is formed on the substrate(11). The layer contains at least PS(Poly-Styrene) and PEO(Poly Ethylene Oxide). The layer is phase-separated and then the region(14) in which etching is facilitated is formed. The imprinting resist layer is formed on the phase-separated layer. The imprinting resist layer is imprinted and then the pattern consisting of the projection(19) and the concave part(18) is formed. The PS of the phase-separated layer and the concave part of the same pattern are removed and then. The anti-etching pattern containing PEO is obtained. The substrate is etched by using the anti-etching pattern and the projection of the pattern as a mask.

摘要翻译： 提供了一种形成图案的方法以使用压印抗蚀剂层并根据记录头的形状来最佳地设计图案。双重嵌段共聚物组合物形成在基材（11）上。 该层至少含有PS（聚苯乙烯）和PEO（聚环氧乙烷）。 该层被相分离，然后形成有助于蚀刻的区域（14）。 在相分离层上形成刻印抗蚀剂层。 压印抗蚀剂层，然后形成由突起（19）和凹部（18）组成的图案。 除去相分离层的PS和相同图案的凹部。 获得含有PEO的抗蚀刻图案。 通过使用抗蚀刻图案和图案的投影作为掩模来蚀刻基板。

公开(公告)号：KR1020090003763A

公开(公告)日：2009-01-12

申请号：KR1020070066696

申请日：2007-07-03

申请人： 주식회사 디엠에스

发明人： 정창호 ,  이진향

IPC分类号： H05B33/10 ,  H01L21/027 ,  H01L21/02

CPC分类号： G03F7/0002 ,  B41K3/02 ,  B81C1/0046 ,  G03F9/7042

摘要： An apparatus and a method for forming an etching region on a substrate are provided to prevent an etching region and a non-etching region from being generated abnormally due to the align error when adhering a soft mold and a substrate. A base plate(4) is installed inside a frame(2). A chamber case(6) is installed in a frame to be separated from a base plate. A soft mold(8) has a pattern surface to classify an etching region and a non-etching region. The soft mold is positioned in the sealing space of the chamber case. A stage(12) has a substrate loading surface. The stage is positioned in the sealing space of the chamber case to be separated from the soft mold. A driving unit(16) is fixed to the base plate. The driving unit generates the power for attaching the soft mold and the substrate. An alignment unit compensates for the attaching position of the substrate according to the position of the soft mold.

摘要翻译： 提供了一种用于在基板上形成蚀刻区域的装置和方法，以防止在粘附软模和基板时由于对准误差而产生异常的蚀刻区域和非蚀刻区域。 基板（4）安装在框架（2）的内部。 室壳体（6）安装在框架中以与基板分离。 软模具（8）具有用于对蚀刻区域和非蚀刻区域进行分类的图案表面。 软模定位在腔室的密封空间中。 工作台（12）具有衬底装载表面。 该台被定位在腔室的密封空间中以与软模分离。 驱动单元（16）固定到基板。 驱动单元产生用于连接软模和基板的动力。 对准单元根据软模的位置来补偿基板的安装位置。

公开(公告)号：KR1020090002815A

公开(公告)日：2009-01-09

申请号：KR1020070067081

申请日：2007-07-04

申请人： 에이피에스홀딩스 주식회사

发明人： 곽신웅 ,  정성운

IPC分类号： H01L21/027

CPC分类号： G03F7/0002 ,  B41K3/00 ,  B81C1/0046

摘要： A dual-sided imprint method using a roll stamp is provided to reduce the manufacturing cost and improve the productivity by consecutively imprinting a substrate. A dual-sided imprint method using a roll stamp comprises a step for delivering a substrate(10) with the line contact method; a step for forming a pattern on both sides of the substrate; a step for solidifying the substrate by irradiating the ultraviolet ray; a step for preparing two roll stamps(20) which have a pattern scale and ultra-violet ray lamp(30) on the surface; a step for coating the both sides of substrate with the ultraviolet resin and hardening the substrate; a step for inputting the substrate between roll stamps; a step for outputting the substrate from the roll stamps by the rotation of roll stamps.

摘要翻译： 提供使用辊印的双面印记法，以通过连续印刷基板来降低制造成本并提高生产率。 使用卷边印模的双面印刷方法包括用线接触方法传送基板（10）的步骤; 用于在基板的两侧上形成图案的步骤; 通过照射紫外线使基板固化的步骤; 制备在表面上具有图案标尺和紫外线灯（30）的两个辊印（20）的步骤; 用紫外线树脂涂覆基板的两面并硬化基板的步骤; 在辊印之间输入基板的步骤; 通过辊戳的旋转从辊戳输出基板的步骤。

公开(公告)号：KR1020090001075A

公开(公告)日：2009-01-08

申请号：KR1020070065174

申请日：2007-06-29

申请人： 에스케이하이닉스 주식회사

发明人： 박준택

IPC分类号： H01L21/027

CPC分类号： G03F7/0002 ,  B81C1/0046 ,  B82Y10/00 ,  B82Y40/00

摘要： A stamp for imprint and a pattern formation method of the semiconductor device using the same are provided to prevent the hardening of the resist residue and form the micro-pattern by preventing that the ultraviolet ray is projected on the resist residue generated in the stamp edge part. A resist layer is formed on the wafer(200). An optical shield layer(225) is formed on the edge part surface of the stamp(220) for imprint. A micro-pattern of the stamp for imprint is imprinted in the resist layer. The resist residue(210b) is generated from the stamp edge part for imprint. The ultraviolet ray is projected on the imprinted resist layer by the stamp for imprint. The resist layer except for the resist residue is hardened by the projection. The micro-pattern(210a) is formed by removing the resist residue.

摘要翻译： 提供用于印记的印模和使用其的半导体器件的图案形成方法，以防止抗蚀剂残留物的硬化并且通过防止紫外线投射到在印模边缘部分中产生的抗蚀剂残留物上而形成微图案 。 在晶片（200）上形成抗蚀剂层。 在印模（220）的边缘部分表面上形成光学屏蔽层（225）用于印记。 用于印记的印模的微图案印在抗蚀剂层中。 抗蚀剂残留物（210b）从用于印记的印模边缘部分产生。 通过用于印记的印模将紫外线投影在印刷的抗蚀剂层上。 除了抗蚀剂残留物之外的抗蚀剂层通过突起硬化。 通过去除抗蚀剂残留物形成微图案（210a）。

公开(公告)号：KR1020080072788A

公开(公告)日：2008-08-07

申请号：KR1020077017084

申请日：2006-11-13

申请人： 파나소닉 주식회사

发明人： 나가이,히사오 ,  요시다,히데히로 ,  후루카와,타카유키 ,  이노우에,타카시

IPC分类号： B29C67/00 ,  B05C5/00 ,  B05C9/12 ,  B81C99/00

CPC分类号： B81C99/0095 ,  B01J19/0046 ,  B01J2219/00378 ,  B01J2219/00527 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00644 ,  B01J2219/00711 ,  B01L3/502707 ,  B29C64/112 ,  B41M3/006 ,  B41M7/0081 ,  B41M7/009 ,  B81B2203/0361 ,  B81C1/0046 ,  B82Y30/00 ,  H05K3/0079 ,  H05K2203/013

摘要： The present invention aims to produce a three-dimensional structure having a high aspect ratio by using inkjet printing techniques or the like. Specifically, a three-dimensional structure is produced by ejecting a liquid drop of a solution, which contains a solvent and polymer particles dispersed in the solvent while having a viscosity of not more than 100 cps, from a nozzle onto a substrate; then evaporating the solvent and melting the polymer particles by irradiating the liquid drop with light; and then depositing the molten polymer particles on the substrate. The present invention can be applied to production of biochips and the like.

摘要翻译： 本发明旨在通过使用喷墨印刷技术等制造具有高纵横比的三维结构。 具体地说，通过将喷嘴内的溶液和分散在溶剂中的聚合物粒子的粘度不超过100cps的溶液的液滴喷射到基板上来制造三维结构体; 然后通过用光照射液滴来蒸发溶剂并熔化聚合物颗粒; 然后将熔融的聚合物颗粒沉积在基底上。 本发明可以应用于生物芯片等的制造。

公开(公告)号：KR1020080046476A

公开(公告)日：2008-05-27

申请号：KR1020060115995

申请日：2006-11-22

申请人： 인베니아 주식회사

发明人： 김은석 ,  권효중

IPC分类号： H01L21/027

CPC分类号： G03F7/0002 ,  B41K3/00 ,  B81C1/0046

摘要： An apparatus for forming a nano-pattern and a method using the same are provided to reduce time for forming the nano-pattern and cut manufacturing costs by dividing a processing space of a chamber into two spaces by a substrate and repeatedly imprinting the nano-pattern onto the substrate. An apparatus for forming a nano-pattern(100) comprises a first chamber(110), a second chamber(120), and a pressure adjustment part. The first chamber comprises a stamp(20) carved with a nano-pattern, and a first sealing member(115) installed on a periphery of an interface between a substrate(10) and the first chamber. The second chamber is conjoined to the first chamber to serve as a process space, and supports the substrate applied with photoresist(12) and moved inline, comprising a second sealing member(125) installed on a periphery of an interface between the substrate and the second chamber. The pressure adjustment part is configured to adjust pressures of a first space(A1) defined between the substrate and the first chamber as the process space is sealed, and a second space(A2) defined between the substrate and the second chamber. The pressure of the second space acts on the side of the first space, such that the substrate is pressurized, imprinting the nano-pattern onto the substrate.

摘要翻译： 提供了一种用于形成纳米图案的装置及其使用方法，以减少形成纳米图案的时间并通过将基板的处理空间划分成两个空间并且重复地印刷纳米图案来降低制造成本 到基板上。 用于形成纳米图案（100）的装置包括第一室（110），第二室（120）和压力调节部分。 第一室包括雕刻有纳米图案的印模（20）和安装在基板（10）和第一室之间的界面的周边上的第一密封构件（115）。 第二室结合到第一室以用作处理空间，并且支撑施加有光致抗蚀剂（12）并在线移动的基板，包括安装在基板和第二室之间的界面的周边上的第二密封构件（125） 第二室。 所述压力调节部构造为在所述处理空间被密封时调整在所述基板与所述第一室之间限定的第一空间（A1）的压力，以及限定在所述基板与所述第二室之间的第二空间（A2）。 第二空间的压力作用在第一空间的一侧，使得基底被加压，将纳米图案压印到基底上。

公开(公告)号：KR100791830B1

公开(公告)日：2008-01-04

申请号：KR1020070013797

申请日：2007-02-09

申请人： 연세대학교 산학협력단

发明人： 서대식 ,  한진우

IPC分类号： H01L21/027 ,  B82Y40/00

CPC分类号： G03F7/0002 ,  B81C1/0046 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S977/887

摘要： A method for fabricating a polycrystalline nano pattern using a nano imprint method is provided to simply fabricate a polycrystalline silicon nano pattern with an excellent charge mobility characteristic on an amorphous silicon substrate without using a complex photolithography process by embodying a nano pattern while crystallizing amorphous silicon by a simple process using a nano imprint method. An amorphous silicon layer is formed on an insulation substrate(10). A buffer layer(20) can be formed between the insulation substrate and the amorphous silicon layer. An imprint mask(50) with a pattern to be transferred is placed on the substrate including the amorphous silicon layer. Laser is irradiated to the substrate to melt the silicon in a portion of the substrate to which the laser having transmitted the imprint mask is irradiated so that a silicon pattern formed along the pattern of the imprint mask is obtained while the amorphous silicon layer is crystallized.

摘要翻译： 提供了使用纳米压印方法制造多晶纳米图案的方法，以简单地制造在非晶硅衬底上具有优异电荷迁移率特性的多晶硅纳米图案，而不需要通过实施纳米图案而通过复合光刻工艺，同时通过 使用纳米压印方法的简单过程。 在绝缘基板（10）上形成非晶硅层。 可以在绝缘基板和非晶硅层之间形成缓冲层（20）。 将具有待转印图案的印模掩模（50）放置在包括非晶硅层的基板上。 激光被照射到衬底上以熔化已经照射了印刷掩膜的激光的衬底的一部分中的硅，使得在非晶硅层结晶的同时获得沿着刻印掩模的图案形成的硅图案。

公开(公告)号：KR1020070117134A

公开(公告)日：2007-12-12

申请号：KR1020060050928

申请日：2006-06-07

申请人： 삼성전자주식회사

发明人： 박정우 ,  최형길 ,  조성훈 ,  김광수 ,  김정길 ,  이석원 ,  이문구

IPC分类号： H01L21/027

CPC分类号： G03F7/0002 ,  B81C1/0046 ,  B82Y10/00 ,  B82Y40/00

摘要： A method for forming a micro pattern using nano imprint is provided to form a pattern having various shapes and to output a hydrophile region and a hydrophobicity region alternately on a micro structure surface without chemical processing. A stamp(100) comprises a positive part(320) and a negative(120) part, wherein a micro structure having a hydrophile property is imprinted at the negative part. The micro structure of the stamp is copied at a surface region of a hydrophile property resist(300) which is coated on a substrate(200) by using a nano imprint.

摘要翻译： 提供了使用纳米压印形成微图案的方法，以形成具有各种形状的图案，并且在微结构表面上交替地输出亲水区域和疏水性区域而无需化学处理。 印模（100）包括正极（320）和负极（120）部分，其中具有亲水性的微结构印在负极部分。 通过使用纳米印记将印模的微结构复制在涂布在基板（200）上的亲水性抗蚀剂（300）的表面区域。