公开(公告)号：KR102115169B1

公开(公告)日：2020-05-26

申请号：KR1020130129418

申请日：2013-10-29

Applicant: 세메스 주식회사

Inventor： 조태현 ,  주재성

IPC: H01L21/67 ,  B08B3/12

公开(公告)号：KR1020170053232A

公开(公告)日：2017-05-16

申请号：KR1020150155446

申请日：2015-11-06

Applicant: 세메스 주식회사

Inventor： 주재성

IPC: G02F1/1333 ,  H01L21/67 ,  H01L21/677 ,  G02F1/13

Abstract: 개시된기판처리장치는기판이송부및 유체분사부를포함할수 있다. 상기기판이송부는기판을일 방향으로이송시킬수 있다. 상기유체분사부는상기기판이송부에의해이송되는상기기판을향하여유체를분사하도록상기기판이송부상부에배치될수 있다. 특히, 상기유체분사부는밴딩구조를갖도록구비될수 있다.

Abstract translation: 所公开的基板处理设备可以包括基板传送部分和流体喷射部分。 基板传送单元可以沿一个方向传送基板。 可以被布置在衬底上方的流体喷射单元被发送到注射流体朝向衬底被传输承载的衬底。 特别地，流体喷射部分可以设置有绑带结构。

公开(公告)号：KR1020130141905A

公开(公告)日：2013-12-27

申请号：KR1020120065004

申请日：2012-06-18

Applicant: 세메스 주식회사

Inventor： 주재성

IPC: H01J9/24

Abstract: An etching device for manufacturing a flat panel display device by performing the etching process of providing an etchant in the spray manner to form a pattern on a substrate comprises a barrier rib which is arranged to surround the side surface of the substrate so that the etchant can dip the substrate when providing the etchant, wherein the barrier rib is arranged so that the etchant can be drained over the barrier rib and that the amount of the etchant provided in the spray manner is smaller than the amount of the etchant drained over the barrier rib.

Abstract translation: 用于制造平板显示装置的蚀刻装置通过执行以喷射方式提供蚀刻剂以在基板上形成图案的蚀刻工艺，包括隔壁，其布置成围绕基板的侧表面，使得蚀刻剂可以 在提供蚀刻剂时浸渍基底，其中隔壁布置成使得蚀刻剂可以排出隔壁，并且以喷雾方式提供的蚀刻剂的量小于在隔离肋上排出的蚀刻剂的量 。

公开(公告)号：KR1020090039429A

公开(公告)日：2009-04-22

申请号：KR1020070105070

申请日：2007-10-18

Applicant: 세메스 주식회사

Inventor： 주재성

IPC: H01L21/68 ,  H01L21/67

CPC classification number: H01L21/67706 ,  H01L21/68707 ,  H01L21/68785

Abstract: A substrate transportation unit for preventing interference between outer-rim and internal-rim of a supporting member is provided to prevent the slip between a supporting member and a shaft. A substrate transportation unit comprises a substrate processing chamber and a power offering room. A substrate processing chamber has return shaft(110). A power offering room has a supporting member(170), a reduction shaft(175) and a motor(140). A motor delivers the torque to return shafts through the reduction shaft and supporting members. A reduction shaft is combined through bearings with supporting members. Each of the bearings is arranged between outer-race and intrados. The rotation of the intrados is not arrested in outer-race through selected one bearing.

Abstract translation: 设置用于防止支撑构件的外缘和内缘之间的干涉的基板输送单元，以防止支撑构件和轴之间的滑动。 基板输送单元包括基板处理室和供电室。 基板处理室具有回流轴（110）。 动力提供室具有支撑构件（170），减速轴（175）和马达（140）。 电机提供扭矩以通过减速轴和支撑构件返回轴。 减速轴通过轴承与支撑构件组合。 每个轴承都布置在外圈和内部之间。 通过选择的一个轴承，内圈的旋转不会在外圈阻止。

公开(公告)号：KR102222263B1

公开(公告)日：2021-03-04

申请号：KR1020180106460

申请日：2018-09-06

Applicant: 세메스 주식회사

Inventor： 현재일 ,  박기홍 ,  주재성

IPC: H01L21/677 ,  H01L21/68 ,  H01L21/687

Abstract: 본발명의실시예에따른기판처리장치는, 제1 및제2 기판을 1매씩순차적으로이송하는기판이송유닛; 1매씩순차적으로이송된제1 및제2 기판을동시에반송하는기판반송유닛; 및기판이송유닛, 기판반송유닛, 또는기판이송유닛및 기판반송유닛에의해이송되거나반송된제1 및제2 기판에소정의처리를수행하는기판처리유닛을포함할수 있다.

公开(公告)号：KR20210002926A

公开(公告)日：2021-01-11

申请号：KR20190078804

申请日：2019-07-01

Applicant: 세메스 주식회사

Inventor： 현재일 ,  박기홍 ,  주재성

IPC: H01L21/677 ,  G03F7/20

Abstract: 본발명의실시예에따른기판처리장치는, 기판에대하여상이한패턴으로노광을수행하도록구성되는제1 노광장치및 제2 노광장치; 및제1 노광장치및 제2 노광장치로기판을반송하고제1 노광장치및 제2 노광장치로부터기판을반송하도록구성되는기판반송장치를포함하고, 기판반송장치는, 제1 노광장치에대하여기판을반입및 반출하도록구성되는제1 트랜스퍼; 제2 노광장치에대하여기판을반입및 반출하도록구성되는제2 트랜스퍼; 제1 트랜스퍼및 제2 트랜스퍼사이에배치되며제1 트랜스퍼및 제2 트랜스퍼로기판을순차적으로반송하도록구성되는제3 트랜스퍼및 제4 트랜스퍼; 및제3 트랜스퍼및 제4 트랜스퍼사이에서배치되며적어도 2단으로복수의기판을이송하도록구성되는다단이송기를포함할수 있다.

公开(公告)号：KR101909989B1

公开(公告)日：2018-10-19

申请号：KR1020120065004

申请日：2012-06-18

Applicant: 세메스 주식회사

Inventor： 주재성

IPC: H01J9/24

Abstract: 평판디스플레이소자제조용식각장치는기판상에패턴이형성되도록스프레이방식으로식각액을제공하는식각공정이이루어지는평판디스플레이소자제조용식각장치에있어서, 상기식각액을제공할때 상기식각액이상기기판을딥핑시킬수 있도록상기기판측면을둘러싸게배치되는격벽을구비하고, 상기격벽은상기식각액이상기격벽을넘어드레인되도록배치됨과아울러상기스프레이방식으로제공되는식각액의양이상기격벽을넘어드레인되는식각액의양보다적도록배치될수 있다.

公开(公告)号：KR1020110080956A

公开(公告)日：2011-07-13

申请号：KR1020100001413

申请日：2010-01-07

Applicant: 세메스 주식회사

Inventor： 주재성

IPC: H01L21/304 ,  G02F1/13

CPC classification number: G02F1/1303 ,  H01L21/67034 ,  H01L21/67207

Abstract: PURPOSE: An apparatus and a method for treating substrates are provided to improve the yield of a product and process efficiency by preventing a dry fail in the end of a substrate. CONSTITUTION: In an apparatus and a method for treating substrates, a chamber(210) provides a process space in which a substrate is processed. A transfer unit is installed in the process space, is mounted in the substrate, and transfers the substrate. A main storage space is arranged in the top and bottom of the transfer unit and dry gas is flowed into an area excluding first and second ends of the substrate. A first end storage space is separated from the main storage space and receives a dry gas to be discharged to a first end. A second end storage space is separated from the main storage space and receives a dry gas to be discharged to a second end.

Abstract translation: 目的：提供一种用于处理基材的设备和方法，以通过防止在基材末端的干燥失败来提高产品的产率和加工效率。 构成：在用于处理基板的装置和方法中，室（210）提供处理基板的处理空间。 传送单元安装在处理空间中，安装在基板中并传送基板。 主存储空间布置在转印单元的顶部和底部，干燥气体流入除了基板的第一和第二端之外的区域。 第一端存储空间与主存储空间分离，并接收要排放到第一端的干燥气体。 第二端存储空间与主存储空间分离并接收要排放到第二端的干燥气体。

公开(公告)号：KR1020110080843A

公开(公告)日：2011-07-13

申请号：KR1020100001259

申请日：2010-01-07

Applicant: 세메스 주식회사

Inventor： 주재성

IPC: H01L21/677 ,  B65G49/06 ,  B65G47/53 ,  G02F1/13

CPC classification number: H01L21/67706 ,  B65G47/53 ,  B65G49/061 ,  B65G49/063 ,  G02F1/1303 ,  H01L21/67715

Abstract: PURPOSE: An apparatus for transferring a substrate is provided to reduce manufacturing costs for the device since there is no additional device for transferring the substrate in transfer section. CONSTITUTION: In an apparatus for transferring a substrate, a rotary unit(110) rotates the substrate(10) while supporting the substrate. A transfer unit(120) transfers a rotary unit in horizontal direction. The rotary unit rotates the substrate which is transferred by the transfer unit.

Abstract translation: 目的：提供一种用于转移基板的装置，以减少装置的制造成本，因为没有用于在转印部分中转印基板的附加装置。 构成：在用于转移衬底的装置中，旋转单元（110）在支撑衬底的同时旋转衬底（10）。 传送单元（120）在水平方向上传送旋转单元。 旋转单元使由转印单元传送的基板旋转。

公开(公告)号：KR1020110056029A

公开(公告)日：2011-05-26

申请号：KR1020090112700

申请日：2009-11-20

Applicant: 세메스 주식회사

Inventor： 주재성

IPC: B65G49/06 ,  B65G21/20 ,  H01L21/677 ,  G02F1/13

CPC classification number: H01L21/67706 ,  B65G21/2072 ,  B65G49/061 ,  B65G49/063 ,  G02F1/1303

Abstract: PURPOSE: A substrate conveyor apparatus is provided to stably convey substrates with various sizes and to easily arrange additional equipment on the bottom of the substrate conveyor apparatus. CONSTITUTION: A substrate conveyor apparatus comprises multiple rollers and side rollers(210,220). The rollers are in contact with the bottom surface of a substrate to convey the substrate in a designed direction. The side rollers are in contact with the side surfaces of the substrate to prevent the substrate from being separated from the designed direction. The substrate comprises a first substrate and a second substrate which has a size different from the first substrate. The side rollers comprise multiple first side rollers, corresponding to the first substrate, and second side rollers, corresponding to the second substrate.

Abstract translation: 目的：提供基板输送装置以稳定地输送各种尺寸的基板，并且可以在基板输送装置的底部容易地布置附加的设备。 构成：衬底输送装置包括多个辊子和侧辊子（210,220）。 辊与基板的底表面接触，以沿设计方向输送基板。 侧辊与基板的侧表面接触以防止基板与设计方向分离。 衬底包括具有不同于第一衬底的尺寸的第一衬底和第二衬底。 侧辊包括对应于第一基板的多个第一侧辊和对应于第二基板的第二侧辊。