摘要:
본 발명은 감광성 수지 조성물에 관한 것으로, 특히 불포화 카르본산, 불포화 카르본산 무수물, 또는 이들의 혼합물 및 올레핀계 불포화 화합물을 공중합시켜 얻어진 아크릴계 공중합체, 다관능성 아크릴 단량체, 광중합 개시제 및 용매를 포함하는 감광성 수지 조성물에 관한 것이다. 본 발명에 따른 감광성 수지 조성물은 기계적 물성 및 고온에서의 내열성이 우수하여 LCD 제조공정의 패턴 스페이서 박막을 형성하기에 적합할 뿐만 아니라, 기재와의 접착성과 내샌드블라스트성이 우수하면서 동시에 높은 해상도를 가지고, 고감도로 기재의 미세 패턴 형성이 가능하다. 감광성 수지, 패턴 스페이서 박막, TFT-LCD
摘要:
본 발명은 옥심 에스테르를 포함하는 트리아진계 광활성 화합물을 포함하는 투명한 감광성 조성물에 관한 것이다. 본 발명에 따른 투명한 감광성 조성물은 광중합 개시제로 한 분자내에 옥심 에스테르기와 트리아진기를 가진 화합물을 사용함으로써, 자외선을 효율적으로 흡수하여 감도, 잔막률, 기계적 강도, 내열성, 내화학성 및 내현상성이 우수하다. 따라서, 본 발명에 따른 투명한 감광성 조성물은 액정표시소자의 컬럼 스페이서, 오버코트 및 패시베이션 재료의 경화에 유리할 뿐만 아니라 고온 공정 특성에도 유리하다.
摘要:
본 발명은 옥심 에스테르기를 포함하는 트리아진계 광활성 화합물에 관한 것이다. 본 발명에 따른 화합물은 한 분자 내에 옥심 에스테르기와 트리아진기를 동시에 포함하는 광활성 화합물로, 자외선 특히 i-라인(365 ㎚)의 자외선을 효율적으로 흡수하여 라디칼을 생성하는 효율이 우수하며, 각종 불포화기 특히 아크릴 화합물의 광중합에 효율적인 개시제로 작용할 수 있다.
摘要:
Provided is a composition for forming a thermosetting resin, which uses a trimethoxysilane group-containing mercaptan compound as a chain transfer agent to provide excellent smoothness, adhesion to a substrate and film strength, and is useful for preparing a protective film for a color filter. The composition for forming a thermosetting resin comprises: (1) (a) monomers comprising 10-30 mole% of an acid group-containing monomer based on the total monomers, (b) 30-50 mole% of an epoxy group-containing monomer based on the total monomers, and (c) 20-60 mole% of an unsaturated ethylene group-containing monomer based on the total monomers; and (2) 0.2-10 parts by weight of a chain transfer agent represented by a formula 1, based on 100 parts by weight of the monomers. In the formula 1, n is an integer of 3-12.
摘要:
Provided are a resin, which is superior in residue characteristics, remaining rate, heat resistance, chemical resistance, CD control, and mechanical properties because a crosslinking density and a glass transition temperature are increased by photo-reactive groups and heat-reactive groups. The resin is obtained by copolymerizing alkyl 2-(hydroxymethyl) group-containing acrylate monomer represented by the following formula 2 with a resin having photo-reactive groups. In the formula 2, R is a straight or branched C1-4 alkyl group. The resin having photo-reactive groups is a compound prepared by undergoing a polymer reaction between an alkali-soluble linear copolymer and an epoxy group-containing ethylenic unsaturated compound, wherein the alkali-soluble linear copolymer is obtained by copolymerizing acid functional group-containing monomer with monomer copolymerizable therewith.
摘要:
A photosensitive resin composition, and a photosensitive pattern spacer thin film prepared by using the composition are provided to improve mechanical properties, heat resistance, the adhesion to a substrate, sand blast resistance, resolution and sensitivity. A photosensitive resin composition comprises 5-40 parts by weight of an acrylic copolymer obtained by copolymerizing an unsaturated carbonic acid, an unsaturated carbonic anhydride or their mixture and an olefin-based unsaturated compound; 5-40 parts by weight of a multifunctional acrylic monomer represented by the formula 1 or 2; 1-50 parts by weight of a photopolymerization initiator; and a solvent in an amount of 20-50 wt% of the solid part of the composition, wherein A is -C(=O)-C(=C)-R; and R is H or a methyl group.
摘要:
Provided is a photoactive oxime ester-based compound, which has no color, absorbs UV rays efficiently, has high photoinitiation efficiency, shows excellent sensitivity to a negative type photoconductor when used in combination with a triazine-based compound, and satisfies an adequate line width of a pattern. The photoactive oxime ester-based compound is represented by any one formula selected from the following formulae(1)-(4). In formulae(1)-(4), each R independently represents H, a C1-C6 alkyl or phenyl, with the proviso that R is not hydrogen in the formulae(1) and (2); each of R1, R2, R3, R4 and R5 independently represents a C1-C6 alkyl, C1-C6 haloalkyl, C1-C6 alkyl in which at least one hetero atom is inserted, substituted or non-substituted phenyl or a C2-C5 alkyl carboxylic acid; R6 is a C2-C5 alkyl substituted with a carboxylic acid, phenyl 2-carboxylate or cyclohexa-4-enyl 2-carboxylate; and X is a C2-C6 alkylene, phenylene or tetrahydrophenylene.