公开(公告)号：KR20070085160A

公开(公告)日：2007-08-27

申请号：KR20070017471

申请日：2007-02-21

申请人： JSR CORP

发明人： MORI KOUSUKE ,  NISHIKAWA KOUJI

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0392 ,  G03F7/40 ,  G03F7/0045

摘要： Provided is a radiation-sensitive positive resin composition which is excellent in sensitivity, resolution and adhesion to a substrate, is developed to form clear apertures without residues, does not contaminate a plating solution, is capable of forming a resin film (resist) which is resistant to cracks after plating, resistant to indentation by plating, and resistant to lifting. A radiation-sensitive positive resin composition comprises a polymer(A) which has at least one end terminated with -SR (wherein R is a linear or branched alkyl group of 1 to 20 carbon atoms, a cyclic alkyl group of 3 to 20 carbon atoms, or a derivative thereof) and includes a structural unit having an acid-dissociative functional group which is dissociated by an acid to yield an acidic functional group; a radiation-sensitive acid generator(B); and an organic solvent(C). The polymer(A) is obtained using a chain transfer agent represented by the formula of R-SR, in which R is a linear or branched alkyl group of 1 to 20 carbon atoms, a cyclic alkyl group of 3 to 20 carbon atoms, or a derivative thereof.

摘要翻译： 提供了对基材的灵敏度，分辨率和粘附性优异的辐射敏感性阳性树脂组合物，被开发成形成无残留物的透明孔，不污染电镀液，能够形成树脂膜（抗蚀剂） 电镀后耐裂纹，耐电镀压痕，耐起吊。 辐射敏感性阳性树脂组合物包含具有至少一个末端以-SR（其中R为碳原子数1〜20的直链或支链烷基），碳原子数为3〜20的环状烷基的聚合物（A） 或其衍生物），并且包括具有酸解离官能团的结构单元，其被酸解离以产生酸性官能团; 辐射敏感酸产生剂（B）; 和有机溶剂（C）。 使用由式R-SR表示的链转移剂得到聚合物（A），其中R为碳原子数1〜20的直链或支链烷基，碳原子数3〜20的环状烷基，或 其衍生物。