Abstract:
The present invention relates to a pH sensitive random copolymer, comprising a methacrylic acid, a methyl methacrylate or a mixture thereof; and an acidic functional group and a basic functional group as a random copolymer of N-isopropylacrylamide, and a carrier for physiologically absorbing materials using the same wherein the carriers like polymer films and microparticles include the acidic functional group and the basic functional group and thus physiologically absorbs various materials whose acidic ranges are not predicted, thereby being widely used in pharmaceutical industry like medical waste absorbing absorbents, drug carriers and cosmetic products and industries.
Abstract:
물품의 표면에 충분한 동적 발수성 및 풍건 후 발수성을 부여할 수 있고, 또한 환경 부하가 낮은 발수 발유제 조성물, 그 제조 방법 및 물품의 처리 방법을 제공한다. 하기 단량체 (a) 에 기초하는 구성 단위, 하기 단량체 (b) 에 기초하는 구성 단위 및 하기 단량체 (c) 에 기초하는 구성 단위를 갖고, 또한 질량 평균 분자량이 40000 이상인 공중합체와, 매체를 포함하는 발수 발유제 조성물을 사용한다. 단량체 (a) : (ZY) n X 로 나타내는 화합물. Z 는 탄소수가 1?6 인 폴리플루오로알킬기 등, Y 는 2 가의 유기기 등, n 은 1 또는 2, X 는 중합성 불포화기이다. 단량체 (b) : 단독 중합체의 유리 전이 온도가 50 ℃ 이하인 올레핀. 단량체 (c) : 폴리플루오로알킬기를 갖지 않고, 탄소수가 12?30 인 알킬기를 갖는 (메트)아크릴레이트.
Abstract:
PURPOSE: An olefin copolymer with a high content of a polar monomer, its preparation method, an olefin copolymer ionomer containing a metal salt and its preparation method are provided, to improve the polymerization velocity and the activity and to increase the content of carboxylic acid inside the polar copolymer. CONSTITUTION: The olefin copolymer is prepared by copolymerizing the α-olefin monomer represented by CH2=CH-R (wherein R is H or a linear, branched or cyclic alkyl group of C1-C10), the unsaturated carboxylic acid polar monomer represented by CH2=CH(CH2)nCOOH (wherein n is an integer of 3-17) and the α-olefin monomer represented by CH2=CH=R (wherein R is H or a linear, branched or cyclic alkyl group of C1-C12), in the presence of a Ziegler-Natta catalyst and an organic aluminium compound. The olefin copolymer ionomer is prepared by crosslinking the olefin copolymer with a metal salt.
Abstract:
PURPOSE: Provided are a photosensitive polymer capable of overcoming problems owing to resistance to dry-etching, adhesion property or wettability of existing resist composition, and a chemically amplified positive resist composition containing the same. CONSTITUTION: The photosensitive polymer, which is used to constitute a positive resist composition, has weight average molecular weight of 3,000-50,000 and comprises the following structure of formula 1(wherein R1 is hydrogen or methyl group, R2 is hydrogen atom, methyl group or trifluoromethyl group, R3 is hydrogen atom or C1-C20 hydrocarbyl group, n is an integer of 1-7, and p/(p+q) = 0.1-0.7). The polymer comprises a terpolymer of following structure of formula 2(wherein, R4 is hydrogen, hydroxyl group, alkyl group, fluorinated alkyl group, alkoxyl group, aldehyde group, ester group, nitrile group, or sulfonated group, p/(p+q+r) = 0.1-0.5, q/(p+q+r) = 0.2-0.5, r/(p+q+r) = 0.1-0.4).