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    감방사선성 수지 조성물, 층간 절연막 및 마이크로렌즈, 및이들의 제조 방법
    2.
    发明公开
    감방사선성 수지 조성물, 층간 절연막 및 마이크로렌즈, 및이들의 제조 방법 有权
    辐射敏感性树脂组合物，中间层绝缘膜和微生物及其生产工艺

    公开(公告)号：KR1020080080453A

    公开(公告)日：2008-09-04

    申请号：KR1020080018915

    申请日：2008-02-29

    Applicant: 제이에스알 가부시끼가이샤

    Inventor： 하마다,겐이찌 ,  하나무라,마사아끼 ,  이이지마,다까히로

    IPC: G03F7/022

    CPC classification number: G03F7/033 ,  C08F220/32 ,  C09D201/08 ,  G03F7/0045 ,  G03F7/0233 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/0755

    Abstract: A radiation-sensitive resin composition is provided to realize high radiation sensitivity, to form a high-quality pattern shape even when a development step is performed for over the optimal development time, and to form a patterned thin film with excellent adhesion. A radiation-sensitive resin composition comprises: [A] a copolymer of (a1) at least one selected from unsaturated carboxylic acids and anhydrides thereof, (a2) an unsaturated compound containing at least one of epoxy and oxetanyl, (a3) at least one selected from acryloylmorpholine and methacryloylmorpholine, and (a4) at least one unsaturated compound other than (a1), (a2) and (a3), selected from alkyl methacrylate, cycloalkyl methacrylate, alkyl acrylate, cycloalkyl acrylate, aryl acrylate, aryl methacrylate, unsaturated dicarboxylate, hydroxymethacrylate, hydroxylacrylate, bicyclic unsaturated compounds, maleimide compounds, unsaturated aromatic compounds, conjugated dienes, unsaturated compounds having a tetrahydropyran backbone, unsaturated compounds having a furan backbone, unsaturated compounds having a tetrahydropyran backbone, unsaturated compounds having a pyran backbone, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide and vinyl acetate; and [B] 1,2-quinonediazide compound.

    Abstract translation: 提供辐射敏感性树脂组合物以实现高辐射敏感性，即使在优化显影时间进行显影步骤时也形成高质量图案形状，并且形成具有优异粘附性的图案化薄膜。 辐射敏感性树脂组合物包含：[a]（a1）选自不饱和羧酸及其酸酐中的至少一种的共聚物，（a2）含有环氧基和氧杂环丁烷基中的至少一种的不饱和化合物，（a3）至少一种 选自丙烯酰吗啉和甲基丙烯酰吗啉，（a4）至少一种不同于（a1），（a2）和（a3）的不饱和化合物，选自甲基丙烯酸烷基酯，甲基丙烯酸环烷基酯，丙烯酸烷基酯，环烷基丙烯酸酯，芳基丙烯酸酯， 二羧酸酯，羟基甲基丙烯酸酯，羟基丙烯酸酯，双环不饱和化合物，马来酰亚胺化合物，不饱和芳族化合物，共轭二烯，具有四氢吡喃骨架的不饱和化合物，具有呋喃骨架的不饱和化合物，具有四氢吡喃主链的不饱和化合物，具有吡喃骨架的不饱和化合物，丙烯腈， 甲基丙烯腈，氯乙烯，偏二氯乙烯，丙烯酰胺，甲基丙烯酰胺和乙烯基 乙酸酯; 和[B] 1,2-醌二叠氮化合物。

    친수처리 조성물
    3.
    发明公开
    친수처리 조성물 有权
    水解组合物

    公开(公告)号：KR1020060111765A

    公开(公告)日：2006-10-30

    申请号：KR1020050034103

    申请日：2005-04-25

    Applicant: 주식회사 엘지생활건강

    Inventor： 박성은 ,  배정환 ,  김동일 ,  노승호 ,  조완구

    IPC: C09D5/00 ,  F28F13/18

    CPC classification number: C09D201/02 ,  C09D5/00 ,  C09D201/025 ,  C09D201/06 ,  C09D201/08 ,  F28F13/18 ,  F28F19/02

    Abstract: Provided is a hydrophilic composition that imparts superior initial hydrophilicity, hydrophilic continuity, coating rigidity, and oil resistance to a heat exchanger radiant fin and continuously improves a heat exchangeability and operability of a heat exchanger. The hydrophilic composition of a heat exchanger radiant fin comprises (a) 1-30wt% of a mixture of (i) a water-soluble resin and (ii) a water-dispersible silica, (b) 0.001-20wt% of a coupling agent, (c) 0.01-30wt% of an anionic surfactant, and (d) the balance of water. The water-soluble resin(i) is a polymeric resin having at least one hydrophilic group selected from the group consisting of an amino group, a carbonyl group, a sulfonic acid group, a hydroxyl group, an amide group, and a polyalkylene oxide group in the molecule. The water-dispersible silica(ii) is water-dispersible colloidal or fumed silica.

    Abstract translation: 本发明提供一种对热交换器辐射翅片具有优异的初始亲水性，亲水连续性，涂层刚性和耐油性的亲水性组合物，并且连续地提高热交换器的热交换性和可操作性。 热交换器辐射翅片的亲水组合物包含（a）1-30重量％的（i）水溶性树脂和（ii）水分散性二氧化硅的混合物，（b）0.001-20重量％的偶联剂 ，（c）0.01-30重量％的阴离子表面活性剂，和（d）余量的水。 水溶性树脂（i）是具有至少一个选自氨基，羰基，磺酸基，羟基，酰胺基和聚环氧烷基的亲水基团的聚合物树脂 在分子中。 水分散性二氧化硅（ii）是水分散性胶体或热解二氧化硅。

    방사선성 보호막 형성용 수지 조성물, 그 조성물로부터보호막을 형성하는 방법, 액정 표시 소자 및 고체 촬상소자
    8.
    发明公开
    방사선성 보호막 형성용 수지 조성물, 그 조성물로부터보호막을 형성하는 방법, 액정 표시 소자 및 고체 촬상소자 有权
    用于形成保护膜的辐射树脂组合物，从组合物形成保护膜的方法，液晶显示装置和固体状态成像装置

    公开(公告)号：KR1020080085759A

    公开(公告)日：2008-09-24

    申请号：KR1020080025349

    申请日：2008-03-19

    Applicant: 제이에스알 가부시끼가이샤

    Inventor： 이또,유끼꼬 ,  이찌노헤,다이고 ,  가지따,도루

    IPC: C08F220/00 ,  C08F222/00 ,  C08F220/10 ,  C08F2/46

    CPC classification number: C09D201/08

    Abstract: A resin composition for forming a radiation sensitive protective film, a protective film formed from the composition, and an LCD device or solid imaging device containing the protective film are provided to improve the smoothness of a cured layer, the development and heat resistance of an LCD device and the storage stability of a composition. A resin composition for forming a radiation sensitive protective film comprises a copolymer comprising (a1) an unsaturated carboxylic acid or anhydride or a mixture of an unsaturated carboxylic acid and an unsaturated carboxylic anhydride, (a2) an epoxy group-containing unsaturated compound, and (a3) other unsaturated compound different from (a1) and (a2); a monofunctional polymerizable unsaturated compound containing a carboxyl group and having a molecular weight of 180 or more; a multifunctional polymerizable unsaturated compound; and a photopolymerization initiator.

    Abstract translation: 提供一种用于形成辐射敏感保护膜的树脂组合物，由该组合物形成的保护膜，以及包含该保护膜的LCD装置或固体成像装置，以提高固化层的平滑度，提高LCD的显影和耐热性 装置和组合物的储存稳定性。 用于形成辐射敏感保护膜的树脂组合物包括共聚物，其包含（a1）不饱和羧酸或酸酐或不饱和羧酸和不饱和羧酸酐的混合物，（a2）含环氧基的不饱和化合物和（ a3）不同于（a1）和（a2）的其它不饱和化合物; 含有羧基且分子量为180以上的单官能聚合性不饱和化合物; 多官能可聚合不饱和化合物; 和光聚合引发剂。

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