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1.发明授权
公开(公告)号：US6129612A
公开(公告)日：2000-10-10
申请号：US156332
申请日：1998-09-18
IPC分类号： B24B1/00
CPC分类号： B24B21/004 , B24B37/048
摘要： Method for removing random scratches formed during the polishing of magnetic recording media, and for disposing on the surface of the media a near-circumferential texture which increases the recording reliability of the media while simultaneously reducing its failure rate. The present invention teaches the application of a low unit load force to a large surface pad and polishing tape combination while in contact with a rotating disk surface that is also moving in a circumferential direction to completely remove the random scratches previously formed by a polishing step. The scratches are removed with the aid of a specially designed, extremely fine alumina slurry composition which prevent producing similar size circumferential scratches at the high surface speeds. The methodology provides for a smoother disk surface than prior known super-polish/texture methodologies. The methodology taught by the principles of the present invention is inherently more uniform than known batch process for polishing and texturing disks and leads to increased efficiency of media manufacturing through reduced manufacturing and post-deployment failures.
摘要翻译： 用于消除在磁记录介质的抛光期间形成的随机刮痕的方法，以及用于在介质的表面上设置近圆周纹理，这增加了介质的记录可靠性同时降低其故障率。 本发明教导了在与也在周向上移动的旋转盘表面接触的同时向大表面焊盘和抛光带组合施加低单位负载力，以完全去除由抛光步骤预先形成的随机划痕。 借助于特殊设计的非常细的氧化铝浆料组合物除去刮痕，防止在高表面速度下产生类似尺寸的圆周划痕。 该方法提供比现有已知的超抛光/纹理方法更平滑的盘表面。 由本发明的原理所教导的方法本身比已知的用于抛光和纹理化盘的批处理更加均匀，并且通过减少制造和部署后的故障而导致媒体制造的效率提高。
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公开(公告)号：US06824896B2
公开(公告)日：2004-11-30
申请号：US10335348
申请日：2002-12-31
IPC分类号： G11B566
CPC分类号： G11B5/732 , G11B5/66 , G11B5/7325 , Y10S428/90 , Y10T428/12465 , Y10T428/12854 , Y10T428/265
摘要： A magnetic media structure 200 deposited on glass substrates without a NiP layer having oriented media (ORMRT>1), high coercivity and high SMNR is presented. This media will significantly reduce the cost of making high quality media on glass substrates by eliminating the cost associated with additional steps of depositing a NiP layer and texturing that layer. First glass substrates are mechanically textured to have a surface roughness of about 1 Å to about 12 Å. The first layer of the magnetic structure contains Cr and Ti with a Ti content of 27 to 63 atomic percentage. The second layer contains Co and Ti with a Ti content of 43 to 55 atomic percentage. The third layer is a Cr-alloy layer wherein the alloy is an element chosen from W, Mo, V, Si, Ti, Mn, Ru, B, Nb, Ta, Zr, and Pt. The fourth layer is Co58Cr37Pt5 and the fifth layer is Co61Cr15Pt12B12. Finally, the protective overcoat is typically a hard material that contains hydrogenated carbon.
摘要翻译： 提出了沉积在不具有定向介质（ORMRT> 1）的NiP层，高矫顽力和高SMNR的玻璃衬底上的磁介质结构200。 该介质将通过消除与沉积NiP层和纹理化该层的附加步骤相关的成本来显着降低在玻璃基板上制造高质量介质的成本。 第一玻璃基板机械地织构成具有大约至大约的表面粗糙度。 磁性结构的第一层含有Ti含量为27〜63原子％的Cr和Ti。 第二层含有Ti含量为43〜55原子百分比的Co和Ti。 第三层是Cr合金层，其中合金是选自W，Mo，V，Si，Ti，Mn，Ru，B，Nb，Ta，Zr和Pt的元素。 第四层为Co58Cr37Pt5，第五层为Co61Cr15Pt12B12。 最后，保护性外涂层通常是含有氢化碳的硬质材料。
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公开(公告)号：US06277005B1
公开(公告)日：2001-08-21
申请号：US09665364
申请日：2000-09-19
IPC分类号： B24B700
CPC分类号： G11B5/84 , B24B7/17 , B24B19/028 , B24B21/004
摘要： Apparatus for removing random scratches formed during the polishing of magnetic recording media, and for disposing on the surface of the media a near-circumferential texture which increases the recording reliability of the media while simultaneously reducing its failure rate. The present invention teaches the application of a low unit load force to a pad and polishing tape combination in contact with a rotating and oscillating disk surface to completely remove the random scratches previously formed by a polishing step. The apparatus facilitates the application of a specially designed, extremely fine alumina slurry composition without producing similar size circumferential scratches at the high surface speeds. The apparatus provides for a smoother disk surface heretofore available, the surface being significantly more uniform than known batch process apparatus for polishing and texturing disks, leading to increased recording reliability, and increased efficiency of manufacturing through reduced manufacturing and post-deployment failures.
摘要翻译： 用于消除在磁记录介质的抛光期间形成的随机划痕，以及用于在介质的表面上设置近圆周纹理的装置，其增加介质的记录可靠性同时降低其故障率。 本发明教导了将低单位负载力施加到与旋转和振动盘表面接触的垫和抛光带组合，以完全去除由抛光步骤预先形成的随机划痕。 该设备有助于特殊设计的非常细的氧化铝浆料组合物的应用，而不会在高表面速度下产生类似尺寸的圆周划痕。 该设备提供了迄今为止可获得的更平滑的盘表面，该表面比用于抛光和纹理化盘的已知批处理设备显着更均匀，从而提高了记录可靠性，并且通过减少制造和部署后故障来提高制造效率。
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公开(公告)号：US6155914A
公开(公告)日：2000-12-05
申请号：US156331
申请日：1998-09-18
CPC分类号： G11B5/84 , B24B19/028 , B24B21/004 , B24B7/17
摘要： Apparatus for removing random scratches formed during the polishing of magnetic recording media, and for disposing on the surface of the media a near-circumferential texture which increases the recording reliability of the media while simultaneously reducing its failure rate. The present invention teaches the application of a low unit load force to a pad and polishing tape combination in contact with a rotating and oscillating disk surface to completely remove the random scratches previously formed by a polishing step. The apparatus facilitates the application of a specially designed, extremely fine alumina slurry composition without producing similar size circumferential scratches at the high surface speeds. The apparatus provides for a smoother disk surface heretofore available, the surface being significantly more uniform than known batch process apparatus for polishing and texturing disks, leading to increased recording reliability, and increased efficiency of manufacturing through reduced manufacturing and post-deployment failures.
摘要翻译： 用于消除在磁记录介质的抛光期间形成的随机划痕，以及用于在介质的表面上设置近圆周纹理的装置，其增加介质的记录可靠性同时降低其故障率。 本发明教导了将低单位负载力施加到与旋转和振动盘表面接触的垫和抛光带组合，以完全去除由抛光步骤预先形成的随机划痕。 该设备有助于特殊设计的非常细的氧化铝浆料组合物的应用，而不会在高表面速度下产生类似尺寸的圆周划痕。 该设备提供了迄今为止可获得的更平滑的盘表面，该表面比用于抛光和纹理化盘的已知批处理设备显着更均匀，从而提高了记录可靠性，并且通过减少制造和部署后故障来提高制造效率。
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