公开(公告)号：US20120045192A1

公开(公告)日：2012-02-23

申请号：US13288133

申请日：2011-11-03

Applicant: Jui-Cheng PENG ,  Tzung-Chi FU ,  Chin-Hsiang LIN ,  Chien-Hsun LIN ,  Chun-Hung LIN ,  Yao-Wen GUO ,  Shy-Jay LIN ,  Heng-Hsin LIU

Inventor： Jui-Cheng PENG ,  Tzung-Chi FU ,  Chin-Hsiang LIN ,  Chien-Hsun LIN ,  Chun-Hung LIN ,  Yao-Wen GUO ,  Shy-Jay LIN ,  Heng-Hsin LIU

IPC: G03B29/00

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70783

Abstract: System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner comprising a wafer table having lens cooling water (“LCW”) disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. The method comprises providing a water tank at at least one of the wafer table input and the wafer table output; monitoring a pressure of water in the water tank; and maintaining the pressure of the water in the water tank at a predetermined level.

Abstract translation: 描述了用于提高浸没式扫描仪覆盖性能的系统和方法。 一个实施例是一种提高光刻浸没式扫描仪的覆盖性能的方法，其包括设置在其中的水通道中的透镜冷却水（“LCW”）的晶片台，晶片台具有用于将LCW接收到水通道中的输入端， 输出用于从水道排出LCW。 该方法包括在晶片台输入和晶片台输出中的至少一个上提供水箱; 监测水箱内的水压; 并且将水箱中的水的压力保持在预定水平。