公开(公告)号：US20110204266A1

公开(公告)日：2011-08-25

申请号：US13125453

申请日：2009-10-19

Applicant: Tor-Arne Gronland ,  Pelle Rangsten ,  Kerstin Jonsson ,  Johan Bejhed

Inventor： Tor-Arne Gronland ,  Pelle Rangsten ,  Kerstin Jonsson ,  Johan Bejhed

IPC: F16K31/12

CPC classification number: F16K99/0001 ,  F16K99/0057 ,  F16K2099/008 ,  Y10T137/1812 ,  Y10T137/7842 ,  Y10T137/8122 ,  Y10T137/87507 ,  Y10T137/87555

Abstract: A micromechanical pressure relief valve arrangement (10) comprises a stack of wafers (13). An active pressure relief valve (20) is realized within the stack of wafers (13). A passive pressure relief valve (30) is also realized within said stack of wafers (13), arranged in parallel to the active pressure relief valve (20). A check valve (50), also realized within the stack of wafers (13), is arranged in series with both the active pressure relief valve (20) and the passive pressure relief valve (30).

Abstract translation: 微机械压力释放阀装置（10）包括一叠晶片（13）。 在晶片堆叠（13）内实现主动减压阀（20）。 在所述堆叠的晶片（13）内还实现被动的压力释放阀（30），其平行于主动减压阀（20）布置。 在晶片堆叠（13）内实现的止回阀（50）与主动减压阀（20）和被动式压力释放阀（30）同时布置。

公开(公告)号：US08684034B2

公开(公告)日：2014-04-01

申请号：US13125453

申请日：2009-10-19

Applicant: Tor-Arne Grönland ,  Pelle Rangsten ,  Kerstin Jonsson ,  Johan Bejhed

Inventor： Tor-Arne Grönland ,  Pelle Rangsten ,  Kerstin Jonsson ,  Johan Bejhed

IPC: F16K31/12

CPC classification number: F16K99/0001 ,  F16K99/0057 ,  F16K2099/008 ,  Y10T137/1812 ,  Y10T137/7842 ,  Y10T137/8122 ,  Y10T137/87507 ,  Y10T137/87555

Abstract: A micromechanical pressure relief valve arrangement comprises a stack of wafers. An active pressure relief valve is realized within the stack of wafers. A passive pressure relief valve is also realized within the stack of wafers, arranged in parallel to the active pressure relief valve. A check valve, also realized within the stack of wafers, is arranged in series with both the active pressure relief valve and the passive pressure relief valve.

Abstract translation: 微机械压力释放阀装置包括一叠晶片。 在堆叠的晶片内实现主动减压阀。 被动的压力释放阀也被实现在平行于主动减压阀的晶片堆内。 还实现了在堆叠的晶片内的止回阀与主动减压阀和被动减压阀两者串联布置。

公开(公告)号：US20130008848A1

公开(公告)日：2013-01-10

申请号：US13637231

申请日：2011-04-04

Applicant: Kerstin Jonsson ,  Maria Bendixen ,  Håkan Johansson ,  Tor-Arne Grönland

Inventor： Kerstin Jonsson ,  Maria Bendixen ,  Håkan Johansson ,  Tor-Arne Grönland

IPC: B01D29/46 ,  B01D29/58

CPC classification number: B01D29/46

Abstract: A filter comprises a stack of wafers (28). Each of the wafers has a through hole (6). Edges (7) of the holes together define an internal tube. An interface (32) between adjacent wafers defines filter channels. The filter channels comprises first coarse filter channels (20), second coarse filter channels (22) and fine filter channels (26). The first coarse filter channels are open towards an outer rim (5), extend in a direction from the outer rim and are closed towards the internal tube. The second coarse filter channels are arranged in an opposite manner. The fine filter channels connect the first and second coarse filter channels. The first and second coarse filter channels extend radially (R) and the fine filter channels extend tangentially (T). The first and second coarse filter channels are defined by recesses in a surface of a first wafer and the fine filter channels are defined by recesses, each one encircling the hole, in a surface of a second wafer.

Abstract translation: 过滤器包括一叠晶片（28）。 每个晶片具有通孔（6）。 孔的边缘（7）一起限定内管。 相邻晶片之间的界面（32）定义了过滤器通道。 滤波器通道包括第一粗滤波器通道（20），第二粗滤波器通道（22）和精滤波器通道（26）。 第一粗过滤器通道朝向外边缘（5）打开，沿着从外边缘的方向延伸并朝向内管封闭。 第二粗滤波器通道以相反的方式布置。 精细滤波器通道连接第一和第二粗滤波器通道。 第一和第二粗滤器通道径向延伸（R），细过滤通道切向延伸（T）。 第一和第二粗滤波器通道由第一晶片的表面中的凹槽限定，并且精细滤波器通道由第二晶片的表面中的每个围绕孔的凹部限定。