-
公开(公告)号：US20240425979A1
公开(公告)日：2024-12-26
申请号：US18802049
申请日：2024-08-13
Applicant: AGC Inc. , TSUBASA SCIENCE CORPORATION
Inventor： Michio ISHIKAWA , Michio TANIMURA , Shuhei OGAWA , Tomonori OGAWA
IPC: C23C16/40 , C23C16/448
Abstract: The present invention relates to an yttrium-based protective film having: a peak intensity ratio of Y5O4F7 in an X-ray diffraction pattern of 80% or more; a porosity of less than 1.5 volume %; and a Vickers hardness of 500 MPa or more. The yttrium-based protective film may have a content of fluorine of 35 atom % to 60 atom %.
Search Results
1
records
(took 0.009 seconds)
筛选
AND
AND
过滤
NOT
NOT
Scan to Join
