公开(公告)号：US20080011965A1

公开(公告)日：2008-01-17

申请号：US11772414

申请日：2007-07-02

申请人： Takuya Matsukawa ,  Shuichiro Fukutome ,  Tomoyuki Horiuchi ,  Hayato Kimura ,  Tateki Watanabe ,  Kiyoshi Hattori

发明人： Takuya Matsukawa ,  Shuichiro Fukutome ,  Tomoyuki Horiuchi ,  Hayato Kimura ,  Tateki Watanabe ,  Kiyoshi Hattori

IPC分类号： G21K1/08 ,  G06F19/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00

摘要： A charged particle beam pattern writing apparatus in accordance with one preferred form of this invention includes an atmospheric pressure measuring unit which measures the value of an atmosphere air pressure, a coordinate value corrector which corrects three-dimensional (3D) coordinate values by use of the value of the air pressure measured, a deflection amount computing unit which calculates the deflection amount of a charged particle beam by using the 3D coordinate values corrected, an irradiator for irradiation of the charged particle beam, and a deflector for deflection of the charged particle beam based on the deflection amount.

摘要翻译： 根据本发明的一个优选形式的带电粒子束图案书写装置包括测量大气压力值的大气压力测量单元，通过使用该气压校正三维（3D）坐标值的坐标值校正器 测量的空气压力的值;偏移量计算单元，其通过使用校正的3D坐标值计算带电粒子束的偏转量;照射器，用于照射带电粒子束;以及偏转器，用于偏转带电粒子束 基于偏转量。

公开(公告)号：US07476881B2

公开(公告)日：2009-01-13

申请号：US11560127

申请日：2006-11-15

申请人： Kiyoshi Hattori ,  Kenji Ohtoshi ,  Tomohiro Iijima ,  Yoshiaki Onimaru ,  Hayato Kimura ,  Tateki Watanabe

发明人： Kiyoshi Hattori ,  Kenji Ohtoshi ,  Tomohiro Iijima ,  Yoshiaki Onimaru ,  Hayato Kimura ,  Tateki Watanabe

IPC分类号： G21K5/04

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31793

摘要： There is provided a charged beam drawing apparatus which includes main/sub two-stage deflectors, divides a main deflection drawing region on a sample into sub deflection drawing regions determined by the deflection width of the sub deflector, selects one of the sub deflection drawing regions by use of the main deflector and draws shots in the selected sub deflection drawing region by use of the sub deflector. A sub deflection driving unit includes a sub deflection sensitivity correction circuit, a sub deflection astigmatic correction circuit, an adder circuit which adds an output of the sub deflection sensitivity correction circuit and an output of the sub deflection astigmatic correction circuit, and a deflection amplifier which additionally applies an output of the adder circuit to the sub deflector.

摘要翻译： 提供了一种带电束的拉伸装置，其包括主/次两级偏转器，将样品上的主偏转绘制区域划分成由次偏转器的偏转宽度确定的次偏转绘图区域，选择一个子偏转绘图区域 通过使用主偏转器，并且通过使用副偏转器在所选择的亚偏转绘图区域中绘制照片。 副偏转驱动单元包括副偏转灵敏度校正电路，副偏转像散校正电路，将副偏转灵敏度校正电路的输出和副偏转像散校正电路的输出相加的加法电路，以及偏转放大器， 另外将加法器电路的输出施加到副偏转器。

公开(公告)号：US07589335B2

公开(公告)日：2009-09-15

申请号：US11772414

申请日：2007-07-02

申请人： Takuya Matsukawa ,  Shuichiro Fukutome ,  Tomoyuki Horiuchi ,  Hayato Kimura ,  Tateki Watanabe ,  Kiyoshi Hattori

发明人： Takuya Matsukawa ,  Shuichiro Fukutome ,  Tomoyuki Horiuchi ,  Hayato Kimura ,  Tateki Watanabe ,  Kiyoshi Hattori

IPC分类号： H01J37/302 ,  H01L21/027

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00

摘要： A charged particle beam pattern writing apparatus in accordance with one preferred form of this invention includes an atmospheric pressure measuring unit which measures the value of an atmosphere air pressure, a coordinate value corrector which corrects three-dimensional (3D) coordinate values by use of the value of the air pressure measured, a deflection amount computing unit which calculates the deflection amount of a charged particle beam by using the 3D coordinate values corrected, an irradiator for irradiation of the charged particle beam, and a deflector for deflection of the charged particle beam based on the deflection amount.

摘要翻译： 根据本发明的一个优选形式的带电粒子束图案书写装置包括测量大气压力值的大气压力测量单元，通过使用该气压校正三维（3D）坐标值的坐标值校正器 测量的空气压力的值;偏移量计算单元，其通过使用校正的3D坐标值计算带电粒子束的偏转量;照射器，用于照射带电粒子束;以及偏转器，用于偏转带电粒子束 基于偏转量。

公开(公告)号：US20070114461A1

公开(公告)日：2007-05-24

申请号：US11560127

申请日：2006-11-15

申请人： Kiyoshi HATTORI ,  Kenji Ohtoshi ,  Tomohiro Iijima ,  Yoshiaki Onimaru ,  Hayato Kimura ,  Tateki Watanabe

发明人： Kiyoshi HATTORI ,  Kenji Ohtoshi ,  Tomohiro Iijima ,  Yoshiaki Onimaru ,  Hayato Kimura ,  Tateki Watanabe

IPC分类号： G21K5/10

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31793

摘要： There is provided a charged beam drawing apparatus which includes main/sub two-stage deflectors, divides a main deflection drawing region on a sample into sub deflection drawing regions determined by the deflection width of the sub deflector, selects one of the sub deflection drawing regions by use of the main deflector and draws shots in the selected sub deflection drawing region by use of the sub deflector. A sub deflection driving unit includes a sub deflection sensitivity correction circuit, a sub deflection astigmatic correction circuit, an adder circuit which adds an output of the sub deflection sensitivity correction circuit and an output of the sub deflection astigmatic correction circuit, and a deflection amplifier which additionally applies an output of the adder circuit to the sub deflector.

摘要翻译： 提供了一种带电束的拉伸装置，其包括主/次两级偏转器，将样品上的主偏转绘制区域划分成由次偏转器的偏转宽度确定的次偏转绘图区域，选择一个子偏转绘图区域 通过使用主偏转器，并且通过使用副偏转器在所选择的亚偏转绘图区域中绘制照片。 副偏转驱动单元包括副偏转灵敏度校正电路，副偏转像散校正电路，将副偏转灵敏度校正电路的输出和副偏转像散校正电路的输出相加的加法电路，以及偏转放大器， 另外将加法器电路的输出施加到副偏转器。