LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
    1.
    发明申请
    LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD 有权
    液体加工设备和液体加工方法

    公开(公告)号:US20130118533A1

    公开(公告)日:2013-05-16

    申请号:US13811522

    申请日:2011-07-12

    IPC分类号: B08B3/04

    摘要: To provide a liquid processing apparatus capable of processing substrates with a high throughput with the lesser number of nozzles for chemical-liquid, when the substrates that are horizontally held in cup bodies are liquid-processed by supplying a chemical liquid to the substrates. Taking a developing process as an example of a liquid process, two-types of developing nozzles are prepared for two types of developing methods. The developing nozzle, which is used in the method in which the nozzle is engaged with the process for a longer period of time, is individually disposed on each of a first processing module 1 and a second processing module 2. On the other hand, the developing nozzle, which is used in the method in which the nozzle is engaged with the process for a shorter period of time, is used in common in the first liquid processing module 1 and the second liquid processing module 2. The common developing nozzle is configured to wait on an intermediate position between the modules 1 and 2.

    摘要翻译: 为了提供一种液体处理装置,当水平保持在杯体中的基板通过向基板供应化学液体进行液体处理时,能够以较少数量的用于液体的喷嘴来处理具有高产量的基板的液体处理装置。 以液体工艺为例的显影过程,为两种显影方法准备了两种类型的显影喷嘴。 在喷嘴与该处理接合较长时间的方法中使用的显影喷嘴被单独地设置在第一处理模块1和第二处理模块2的每一个上。另一方面, 在第一液体处理模块1和第二液体处理模块2中共同使用在喷嘴与该工艺相比较短时间接合的方法中使用的显影喷嘴。公知的显影喷嘴被配置 等待模块1和2之间的中间位置。

    Liquid processing apparatus and liquid processing method
    2.
    发明授权
    Liquid processing apparatus and liquid processing method 有权
    液体处理装置和液体处理方法

    公开(公告)号:US08636915B2

    公开(公告)日:2014-01-28

    申请号:US13811522

    申请日:2011-07-12

    摘要: To provide a liquid processing apparatus capable of processing substrates with a high throughput with the lesser number of nozzles for chemical-liquid, when the substrates that are horizontally held in cup bodies are liquid-processed by supplying a chemical liquid to the substrates. Taking a developing process as an example of a liquid process, two-types of developing nozzles are prepared for two types of developing methods. The developing nozzle, which is used in the method in which the nozzle is engaged with the process for a longer period of time, is individually disposed on each of a first processing module 1 and a second processing module 2. On the other hand, the developing nozzle, which is used in the method in which the nozzle is engaged with the process for a shorter period of time, is used in common in the first liquid processing module 1 and the second liquid processing module 2. The common developing nozzle is configured to wait on an intermediate position between the modules 1 and 2.

    摘要翻译: 为了提供一种液体处理装置,当水平保持在杯体中的基板通过向基板供应化学液体进行液体处理时,能够以较少数量的用于液体的喷嘴来处理具有高产量的基板的液体处理装置。 以液体工艺为例的显影过程,为两种显影方法准备了两种类型的显影喷嘴。 在喷嘴与该处理接合较长时间的方法中使用的显影喷嘴被单独地设置在第一处理模块1和第二处理模块2的每一个上。另一方面, 在第一液体处理模块1和第二液体处理模块2中共同使用在喷嘴与该工艺相比较短时间接合的方法中使用的显影喷嘴。公知的显影喷嘴被配置 等待模块1和2之间的中间位置。