公开(公告)号：US20130294756A1

公开(公告)日：2013-11-07

申请号：US13886261

申请日：2013-05-02

Applicant: AP SYSTEMS INC.

Inventor： Il-Hwan LIM ,  Jang-Woo SHIM ,  Chul-Soo KIM ,  Seung-Ae CHOI

IPC: H01L21/67

CPC classification number: H01L21/67115 ,  F27B17/0025 ,  H05B3/0047

Abstract: The present invention relates to an apparatus for heat-treating a substrate, and more particularly to an apparatus for substrate treatment to perform a heat treatment of a substrate for a flat panel display panel.An apparatus for substrate treatment according to an embodiment of the present invention comprises a processing chamber having a substrate treatment space; a heating housing having a heating lamp that emits radiant energy and a reflecting block that reflects radiant energy emitted from the heating lamp; and a window that maintains a sealing between the processing chamber and the heating housing and transmits the radiant energy to a substrate.

Abstract translation: 本发明涉及一种用于对基板进行热处理的装置，更具体地涉及用于对平板显示面板进行基板的热处理的基板处理装置。 根据本发明的实施例的用于基板处理的装置包括具有基板处理空间的处理室; 具有发射辐射能的加热灯的加热壳体和反射从加热灯发出的辐射能的反射块; 以及在处理室和加热壳体之间保持密封并将辐射能传递到基板的窗口。