公开(公告)号：US12091744B2

公开(公告)日：2024-09-17

申请号：US16973114

申请日：2019-04-23

Applicant: ARCELORMITTAL

Inventor： Eric Silberberg ,  Thiago Rabelo Nunes Campos ,  Negar Gilani

IPC: C23C14/16 ,  C23C14/04 ,  C23C14/24 ,  C23C14/56

CPC classification number: C23C14/562 ,  C23C14/04 ,  C23C14/16 ,  C23C14/24

Abstract: A method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a Vacuum deposition facility including a vacuum chamber, a coated substrate coated with at least one metal on both sides of the substrate and a vacuum deposition facility.