Vacuum deposition facility and method for coating a substrate with transverse repartition chamber

    公开(公告)号:US12129542B2

    公开(公告)日:2024-10-29

    申请号:US16972176

    申请日:2019-06-11

    Applicant: ArcelorMittal

    CPC classification number: C23C14/562 C23C14/243

    Abstract: A vacuum deposition facility 1 for continuously depositing, on a running substrate S, coatings formed from metal or metal alloy, the facility including an evaporation crucible 4 suited to supply metal or metal alloy vapor and including an evaporation pipe 7, a deposition chamber 2 suited to have the substrate S run through along a given path P and a vapor jet coater 3 linking the evaporation pipe to the deposition chamber, wherein the vapor jet coater further includes a repartition chamber 31 including at least one reheater 33 positioned within the repartition chamber and a vapor outlet orifice 32 including a base opening linking the vapor outlet orifice to the repartition chamber, a top opening through which the vapor can exit in the deposition chamber and two sides converging toward each other in the direction of the top opening.

    Equipment for coating a metal strip

    公开(公告)号:US11313023B2

    公开(公告)日:2022-04-26

    申请号:US16058009

    申请日:2018-08-08

    Applicant: ArcelorMittal

    Abstract: Equipment for manufacturing a metal strip coated by a process that includes vacuum-depositing a layer of an oxidizable metal or an oxidizable metal alloy on a metal strip precoated with zinc or with a zinc alloy, then coiling the coated metal strip, then oxidizing a surface of the metal strip coated with the oxidizable metal or oxidizable metal alloy and treating the oxidized wound coil with a static diffusion treatment to obtain a strip having a coating that includes, in an upper portion, a layer of an alloy formed by diffusion of the oxidizable metal or the oxidizable metal alloy in all or part of the zinc or zinc alloy layer. The equipment includes a device for galvanizing the metal strip, a vacuum deposition coating device, and a static heat treatment device operating in a controlled atmosphere.

    PLASMA SOURCE
    4.
    发明申请
    PLASMA SOURCE 有权
    等离子体源

    公开(公告)号:US20160005575A1

    公开(公告)日:2016-01-07

    申请号:US14765817

    申请日:2013-02-06

    Abstract: The invention relates to a plasma source (1) for depositing a coating onto a substrate (9), which is connectable to a power source (P) and includes: an electrode (2); a magnetic assembly (4) located circumferentially relative to said electrode and including a set of magnets mutually connected by a magnetic bracket (46) including a first and second central magnet (43, 44) and at least one head magnet (45); and an electrically insulating enclosure (5) arranged such as to surround the electrode and the magnets.

    Abstract translation: 本发明涉及一种用于将涂层沉积在可连接到电源(P)上的衬底(9)上的等离子体源(1),包括:电极(2); 磁性组件(4),其位于周向相对于所述电极并且包括通过包括第一和第二中心磁体(43,44)和至少一个磁头磁体(45)的磁性支架(46)相互连接的一组磁体; 以及布置成围绕电极和磁体的电绝缘外壳(5)。

    Apparatus and method for vacuum deposition

    公开(公告)号:US11319626B2

    公开(公告)日:2022-05-03

    申请号:US16318563

    申请日:2017-07-27

    Applicant: ArcelorMittal

    Abstract: A vacuum deposition facility is provided for continuously depositing on a running substrate coatings formed from metal alloys including a main element and at least one additional element. The facility includes a vacuum deposition chamber and a substrate running through the chamber. The facility also includes a vapor jet coater, an evaporation crucible for feeding the vapor jet coater with a vapor having the main element and the at least one additional element, a recharging furnace for feeding the evaporation crucible with the main element in molten state and maintaining a constant level of liquid in the evaporation crucible, and a feeding unit being fed with the at least one additional element in solid state for feeding the evaporation crucible with the at least one additional element either in molten state, in solid state or partially in solid state. A process is also provided.

    Method for Coating a Substrate and Metal Alloy Vacuum Deposition Facility

    公开(公告)号:US20180112305A1

    公开(公告)日:2018-04-26

    申请号:US15851154

    申请日:2017-12-21

    Applicant: ArcelorMittal

    Abstract: A vacuum deposition facility for continuously depositing coatings formed from metal alloys having at least two metallic elements on a running substrate is provided. The vacuum deposition facility includes a vacuum deposition chamber, a substrate running through the vacuum deposition chamber and an evaporation crucible inside the vacuum deposition chamber. The evaporation crucible includes a heater and a bath of molten metal alloy which has at least two metallic elements in a predetermined and constant ratio. The evaporation crucible evaporates the molten metal alloy into a vapor. The vacuum deposition facility also includes a coater inside the vacuum deposition chamber and connected to the evaporation crucible. The coater sprays a face of the running substrate with the vapor at a sonic velocity in order to deposit a coating on the running substrate. The vapor includes the at least two metallic elements in the predetermined and constant ratio.

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