公开(公告)号：US20200292943A1

公开(公告)日：2020-09-17

申请号：US16629130

申请日：2018-07-09

Applicant: ARIZONA BOARD OF REGENTS ON BEHALF OF THE UNIVERSITY OF ARIZONA

Inventor： Yuzuru TAKASHIMA ,  Christopher R. SUMMITT ,  Sunglin WANG

IPC: G03F7/20 ,  G02B6/42 ,  G03F7/039 ,  G03F7/26 ,  G03F7/09 ,  G03F1/42 ,  G03F7/00

Abstract: A lithographic method for making an out-of-plane optical coupler includes forming a photoresist layer of positive photoresist material over a substrate. The positive photoresist layer undergoes a flood exposure to light through a binary mask to pattern a latent image of a mirror blank in the photoresist layer. A laser beam is scanned over the latent image of the mirror blank to apply controlled dosages of light at specified locations to form a latent image of a planar mirror surface that is oriented at a prescribed non-zero angle to a plane in which the substrate extends. The positive photoresist material is developed so that a remaining portion of the developed positive photoresist material forms an out-of-plane optical coupler having a planar mirror surface that is oriented at the prescribed angle.