公开(公告)号：US20250092516A1

公开(公告)日：2025-03-20

申请号：US18884515

申请日：2024-09-13

Applicant: ASM IP Holding B.V.

Inventor： Nirmal Gokuldas Waykole ,  Jereld Lee Winkler ,  Yeonsu Rhee ,  Jonathan Bakke ,  Shubham Garg ,  Arjav Prafulkumar Vashi ,  Qi Qi ,  Shuaidi Zhang ,  Joshua Tyler Aragon ,  Chen Zhang

IPC: C23C16/44 ,  C23C16/455 ,  C23C16/458

Abstract: A substrate processing apparatus includes an upper chamber space, a lower chamber space, a susceptor, and a flow control ring assembly comprising a seal ring and a flow control ring having a shape to surround the susceptor, the flow control ring assembly sealing or substantially sealing the upper chamber space from the lower chamber space while the susceptor in a first position.