公开(公告)号：US20250092516A1

公开(公告)日：2025-03-20

申请号：US18884515

申请日：2024-09-13

Applicant: ASM IP Holding B.V.

Inventor： Nirmal Gokuldas Waykole ,  Jereld Lee Winkler ,  Yeonsu Rhee ,  Jonathan Bakke ,  Shubham Garg ,  Arjav Prafulkumar Vashi ,  Qi Qi ,  Shuaidi Zhang ,  Joshua Tyler Aragon ,  Chen Zhang

IPC: C23C16/44 ,  C23C16/455 ,  C23C16/458

Abstract: A substrate processing apparatus includes an upper chamber space, a lower chamber space, a susceptor, and a flow control ring assembly comprising a seal ring and a flow control ring having a shape to surround the susceptor, the flow control ring assembly sealing or substantially sealing the upper chamber space from the lower chamber space while the susceptor in a first position.

公开(公告)号：US20240425987A1

公开(公告)日：2024-12-26

申请号：US18746191

申请日：2024-06-18

Applicant: ASM IP Holding B.V.

Inventor： Qi Qi ,  Rajmohan Muthaiah ,  Shubham Garg ,  Jaebeom Lee ,  YoungChol Byun ,  Daniel Maurice ,  Nirmal Gokuldas Waykole ,  Jiyeon Kim ,  Jacqueline Wrench ,  Neelam Sheoran ,  Guannan Chen

IPC: C23C16/455

Abstract: Various embodiments of the present technology may provide a showerhead assembly that includes a showerhead plate having a plurality of through-holes. Each through-hole has a conical-shaped inlet and a conical-shaped outlet. The showerhead plate may include through-holes in a center region having first dimensions and through-holes in an outer region having second dimensions that are different from the first dimensions.