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公开(公告)号：US20240417855A1
公开(公告)日：2024-12-19
申请号：US18739563
申请日：2024-06-11
Applicant: ASM IP Holding B.V.
Inventor： Ippei Yanagisawa , Takashi Hamaguchi
IPC: C23C16/458
Abstract: A substrate supporting apparatus includes: a susceptor configured for a substrate to be place on; and a moving mechanism that is connected to the susceptor and configured to rotate the susceptor about a central axis of the susceptor, the central axis extending in a vertical direction, wherein the moving mechanism is configured to move the susceptor further in a direction extending in an imaginary horizontal plane perpendicular to the central axis.
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